9 November 2016 A blu-ray laser diode based dual-beam interference lithography for fabrication of diffraction gratings for surface encoders
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Abstract
The paper presents a dual-beam interference lithography technology for fabrication of diffraction gratings for surface encoders by using cost-effective 405 nm blu-ray laser diodes. In this system, an amplitude division interferometer system is employed. A laser beam raying from a blu-ray laser diode is collimated and then divided into two beams by a beam splitter. These two beams are changed their propagation directions and interfere with each other. Generated interference fringes are exposed on the photoresist coated substrate. Grating line spacing d can be adjusted by changing the incident angle between these two beams. Grating width Wc that determines the measurement of the surface encoder is decided by the coherence length Lc of the laser diode and the grating line spacing d. Calculation and simulation were carried out to decide the grating width. Lc was experimentally obtained. A fabrication system was constructed to verify the feasibility of this technology. Diffraction gratings with a 2.5 micron line spacing and a 2.5 mm width was obtained.
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Xiangwen Zhu, Xiangwen Zhu, Xinghui Li, Xinghui Li, Qian Zhou, Qian Zhou, Xiaohao Wang, Xiaohao Wang, Kai Ni, Kai Ni, } "A blu-ray laser diode based dual-beam interference lithography for fabrication of diffraction gratings for surface encoders", Proc. SPIE 10018, Advanced Laser Processing and Manufacturing, 100180A (9 November 2016); doi: 10.1117/12.2245710; https://doi.org/10.1117/12.2245710
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