31 October 2016 Design and numerical simulation of a silicon-based linear polarizer with double-layered metallic nano-gratings
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Abstract
With the increasing demand for linearly polarized elements with high performance in many fields and applications, design and fabrication of sub-wavelength metallic linear polarizer have made tremendous progress in recent years. In this paper, we proposed a novel structure of a silicon-based linear polarizer working in the infrared (3-5μm) waveband with a double-layered metallic grating structure. A two-layer metallic grating with a transition layer of low refractive index is fabricated on a silicon substrate. In contrast to those conventional single layer metallic polarizing grating, the multilayer polarizing structure has the advantages of easy fabrication and high performance. Numerical simulation results show that an extinction ratio of linear polarization can be up to 58.5dB and the TM-polarized light transmission is greater than 90%. The behaviors and advantages of the proposed multilayer polarizer are compared with that of a traditional single-layer metallic grating. The proposed silicon-based linear polarizer will have great potential applications in real-time polarization imaging with high extinction ratio and high transmission.
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Yu Lin, Yu Lin, Jingpei Hu, Jingpei Hu, Chinhua Wang, Chinhua Wang, } "Design and numerical simulation of a silicon-based linear polarizer with double-layered metallic nano-gratings", Proc. SPIE 10022, Holography, Diffractive Optics, and Applications VII, 100221P (31 October 2016); doi: 10.1117/12.2245031; https://doi.org/10.1117/12.2245031
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