The chirped-pulse amplification system plays a critical role in the process of achieving high-peak ultrashort pulses. Chirped-pulse amplification technology performance mainly depends on the pulse compression gratings. Diffraction efficiency is the critical parameter of the pulse compression gratings, and optimization of grating shape can achieve higher diffraction efficiency. If the photoresist grating mask bottom is not clean, the side walls would not be steep and duty cycle would be too big or too small, thus pulse compression grating diffraction efficiency would decrease. Solving these problems is the key to improve the diffraction efficiency. In this paper, oxygen etching methods are used to reduce the photoresist mask duty cycle, and PDMS pressing method is used to increase the duty cycle of photoresist mask, and aperture up to 100 mm×100 mm. Best photoresist grating mask parameter could be obtained by effectively combining the above two methods. Based on above techniques, a number of pulse compression gratings with line densities of 1740 lines∕mm was achieved. The diffraction efficiency at the-1st order was greater than 99% for TE polarized light. A qualitative judgments for graphic transfer of ion beam etching is received through the picture before and after etching which is get from the SEM. These experimental results proved the accuracy, stability, and success rates of the technique.