31 October 2016 Tunable nano-pattern generation and photolithography using hybrid Kretschmann and Otto structures
Author Affiliations +
Abstract
We propose a continuous tuning SPPs interference photolithography using hybrid Kretschmann and Otto structures. The patterns are formed by the interference of two kinds of SPPs excited by Kretschmann structure and Otto structure respectively, and the tuning capability is implemented by changing the angle between the two kinds of SPPs beams and varying the amplitude and phase of corresponding incident beams. Numerical results show the flexibility and convenience in tuning of interference patterns and resolutions with high contrast, both one and two dimension periodic patterns can be generated and tuned easily. This proposed method is possible to develop a new tunable SPPs photolithography technique for fabrication of periodic nanostructures.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fuyang Xu, Chinhua Wang, Jingpei Hu, "Tunable nano-pattern generation and photolithography using hybrid Kretschmann and Otto structures", Proc. SPIE 10022, Holography, Diffractive Optics, and Applications VII, 1002220 (31 October 2016); doi: 10.1117/12.2246260; https://doi.org/10.1117/12.2246260
PROCEEDINGS
10 PAGES


SHARE
Back to Top