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31 October 2016 Tunable nano-pattern generation and photolithography using hybrid Kretschmann and Otto structures
Fuyang Xu; Chinhua Wang; Jingpei Hu
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Proceedings Volume 10022, Holography, Diffractive Optics, and Applications VII; 1002220 (2016) https://doi.org/10.1117/12.2246260
Event: SPIE/COS Photonics Asia, 2016, Beijing, China
Abstract
We propose a continuous tuning SPPs interference photolithography using hybrid Kretschmann and Otto structures. The patterns are formed by the interference of two kinds of SPPs excited by Kretschmann structure and Otto structure respectively, and the tuning capability is implemented by changing the angle between the two kinds of SPPs beams and varying the amplitude and phase of corresponding incident beams. Numerical results show the flexibility and convenience in tuning of interference patterns and resolutions with high contrast, both one and two dimension periodic patterns can be generated and tuned easily. This proposed method is possible to develop a new tunable SPPs photolithography technique for fabrication of periodic nanostructures.
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Fuyang Xu, Chinhua Wang, and Jingpei Hu "Tunable nano-pattern generation and photolithography using hybrid Kretschmann and Otto structures", Proc. SPIE 10022, Holography, Diffractive Optics, and Applications VII, 1002220 (31 October 2016); https://doi.org/10.1117/12.2246260
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