Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 10023, including the Title Page, Copyright information, Table of Contents, and Conference Committee listing.

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Author(s), “Title of Paper,” in Optical Metrology and Inspection for Industrial Applications IV, edited by Sen Han, Toru Yoshizawa, Song Zhang, Proceedings of SPIE Vol. 10023 (SPIE, Bellingham, WA, 2016) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510604650

ISBN: 9781510604667 (electronic)

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Authors

Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Aketagawa, Masato, 07, 1M

Bai, Jian, 0L, 0T

Bokhman, Evgueny D., 0W, 1B

Boronahin, Alexandr M., 1B

Bossmeyer, Hagen, 1E

Buranasiri, Prathan, 05

Cai, Zihang, 1F

Cao, Pin, 0L, 0T

Chai, Huiting, 0L, 0T

Chen, Chi, 1Y

Chen, Meng, 03

Chen, Nian, 23

Chen, Ran, 19

Chen, Shengyi, 1Q

Chen, Yongquan, 1C

Cheng, Weilin, 15

Cheng, Xiaosheng, 1N, 20

Cheng, Yuxin, 0D

Cheng, Zhi, 22

Chu, Chu, 1Y

Cui, Haihua, 1N, 20, 21

Cui, Jiwen, 1J

Dan, Xizuo, 1O

Dang, Hong, 1J

Deng, Fuqin, 0Y

Ding, Yi, 0Y

Duan, Yaxuan, 1C

Fan, Qiming, 1Y

Feng, Kunpeng, 1J

Feng, Qiaoling, 26

Filatov, Yuri V., 0W, 1B

Gao, Chao, 25

Gao, Feng, 0X

Gao, Jianmin, 0B

Gao, Limin, 1C

Gao, Nan, 0S, 0X

Gao, Shuyuan, 22

Gao, Songtao, 0C

Gu, Liyuan, 15

Guo, Changye, 20

Guo, Jiao, 0X

Guo, Yongcai, 26

Han, Sen, 0F

Hao, Qun, 03

He, Hongbo, 15

Higuchi, Masato, 07

Hii, K. U., 0E

Hu, Guohang, 15

Hu, Kai, 1A

Hu, Kelin, 25

Hu, Shiyu, 15

Hu, Yao, 03

Hu, Yue, 1O

Huang, Anqi, 1O

Huang, Fengshan, 1X

Huang, Huijie, 15

Huang, Junhui, 0B

Huang, Shujun, 0S, 0X

Ivanov, P. A., 0W

Jeong, Dohwan, 0P

Ji, Rongyi, 22

Jia, Huayu, 20

Jiang, Xiangqian, 0X

Jin, Tao, 0F

Jin, Zexuan, 23

Jing, Tang, 29

Kamoldilok, Surachart, 05

Kästner, Markus, 0K, 1E

Katagiri, Tomoya, 1M

Lao, Dabao, 28

Larichev, R. A., 0W

Larionov, Daniil Yu., 1B

Lee, Jun Ho, 0P

Lei, Tao, 29

Li, Bo, 1S

Li, Chen, 0L, 0T

Li, Dawei, 1N

Li, Dong, 14

Li, Junying, 1J

Li, Lin, 03

Li, Sining, 0D

Li, Tengfei, 03

Li, Xinghui, 0Z, 1A, 1D

Li, Yan, 1F

Li, Yao, 22

Li, Yinan, 1E

Li, Yuehua, 1X

Li, Zhongwei, 04, 19

Liu, Dong, 0L, 0T

Liu, Fengwei, 27

Liu, Haibo, 1Q

Liu, Hui, 0Q

Liu, Huixian, 0S

Liu, Jian, 0Q

Liu, Kuo, 12

Liu, Lijian, 1X

Liu, Meng, 19

Liu, Wende, 1Y

Liu, Yongxin, 0V

Liu, Yue, 0X

Long, Chen, 29

Luo, Songjie, 0V

Ma, Suodong, 1S

Matthias, Steffen, 0K

Miao, Erlong, 0C

Michihata, Masaki, 16

Mizutani, Yasuhiro, 0N, 16

Ni, Kai, 0Z, 1A, 1D

Ni, Wei-Tou, 0F

Niu, Zhenqi, 0X, 12

Park, Chris, 0P

Park, Jun Hyung, 0P

Pavlov, P. A., 0W

Pei, Limei, 09

Peng, Kai, 0Y

Peng, Shijun, 0C

Phongwisit, Phachara, 05

Podgornaya, Liudmila N., 1B

Pu, Jixiong, 0V

Qi, Jingya, 0B

Qi, Shao-fan, 17

Reithmeier, Eduard, 0K, 1E

Ren, Guoying, 09

Sasaki, Osami, 0V

Shalymov, Roman V., 1B

Shan, Guohang, 0D

Shen, Yibing, 0L, 0T

Shi, Kai, 1V

Shi, Yusheng, 04

Shin, Eun Ji, 0P

Sun, Haibin, 1K, 1U, 1V

Sun, Mingyong, 1V

Sun, Ping, 1K, 1U, 1V

Takaya, Yasuhiro, 0N, 16

Tan, Jiubin, 1J

Tang, Hongwei, 04

Tian, Jindong, 14

Tian, Liude, 1C

Tian, Yong, 14

Ueda, Kazunori, 0N

Vu, Thanh-Tung, 07

Wang, Huanhuan, 0Z, 1D

Wang, Lidai, 1A

Wang, Qiyue, 0I

Wang, Shaopu, 03

Wang, Weinong, 09

Wang, Wenjie, 23

Wang, Xiaohao, 0Z, 1A, 1D

Wang, Xinghai, 1U

Wang, Yonghong, 1O

Wang, Yuan-yuan, 17

Wang, Zhao, 0B

Wei, Dong, 1M

Wei, Haoyun, 1F

Wei, Hengzheng, 09

Wu, Dongcheng, 0C

Wu, Fan, 0L, 0T

Wu, Guanghua, 0I

Wu, Kaihua, 23

Wu, Yongqian, 27

Xi, Jiangtao, 0Y

Xiao, Hong, 0O

Xiao, Xiang, 0Z, 1D

Xiao, Ying, 1O

Xiong, Haoliang, 0L, 0T

Xu, Bin, 14

Xu, Jian, 29

Xu, Min, 0O

Xu, Renchao, 1Z

Xu, Wenlin, 0L, 0T

Xue, Xun, 1C

Yamaguchi, Yuki, 16

Yan, Kai, 0L, 0T

Yang, Honglei, 1F

Yang, Lianxiang, 1O

Yang, Liu, 21

Yang, Yongying, 0L, 0T

Yao, Linshen, 1Q

Yin, Wei, 1N, 21

Yin, Yongkai, 0Y

Yu, Bao, 0B

Yu, Qifeng, 1Q

Yuan, Qiao, 15

Zeng, Aijun, 15

Zhan, Guomin, 04, 19

Zhang, Chenbo, 1N, 21

Zhang, Haoran, 1J

Zhang, Qican, 1Z

Zhang, Shanhua, 15

Zhang, Weipeng, 1F

Zhang, Wenying, 28

Zhang, Xiangchao, 0O

Zhang, Xiaolei, 0O

Zhang, Yan, 0I

Zhang, Yihui, 0L, 0T

Zhang, Zhan-dong, 17

Zhang, Zili, 0I

Zhang, Zonghua, 0S, 0X, 12

Zhao, Jianke, 1C

Zhao, Shiyuan, 1J

Zhao, Weiqiang, 0Q

Zhao, Zhimin, 20

Zheng, Jun, 17

Zhong, Kai, 04, 19

Zhou, Fangyan, 1Z

Zhou, Jingbo, 1X

Zhou, Lin, 0L, 0T

Zhou, Qian, 0Z, 1A, 1D

Zhou, Sen, 29

Zhou, Weihu, 0I, 22, 28

Zhu, Xiaoqiang, 27

Zhu, Ziqi, 0Y

Symposium Committees

General Chairs

  • Robert Lieberman, SPIE President, Lumoptix, LLC (United States)

  • Guangcan Guo, Chinese Optical Society President, University of Science and Technology of China (China)

General Co-chairs

  • Arthur Chiou, National Yang-Ming University (Taiwan, China)

  • Jianlin Cao, China Ministry of Science and Technology (China)

  • Junhao Chu, Shanghai Institute of Technical Physics (China)

Technical Program Chairs

  • Songlin Zhuang, University of Shanghai for Science and Technology (China)

  • Xingde Li, Johns Hopkins University (United States)

Technical Program Co-chairs

  • Bingkun Zhou, Tsinghua University (China)

  • Qiming Wang, Institute of Semiconductors (China)

  • Tianchu Li, National Institute of Metrology (China)

  • Wei Huang, Nanjing University of Technology (China)

  • Ying Gu, PLA General Hospital (China)

  • Huilin Jiang, Changchun University of Science and Technology (China)

Local Organizing Committee Chair

  • Qihuang Gong, Peking University (China)

Local Organizing Committee Co-chairs

  • Xu Liu, Zhejiang University (China)

  • Daoyin Yu, Tianjin University (China)

  • Guoqiang Ni, Beijing Institute of Technology (China)

  • Shusen Xie, Fujian Normal University (China)

  • Xiaomin Ren, Beijing University of Posts and Telecommunications (China)

General Secretary

  • Yan Li, Chinese Optical Society/Peking University (China)

Local Organizing Committee

  • Zhiping Zhou, Peking University (China)

  • Changhe Zhou, Shanghai Institute of Optics and Fine Mechanics, CAS (China)

  • Qingming Luo, Huazhong University of Science and Technology (China)

  • Chongxiu Yu, Beijing University of Posts and Telecommunication (China)

  • Hongda Chen, Institute of Semiconductors (China)

  • Yongtian Wang, Beijing Institute of Technology (China)

  • Yiping Cui, Southeast University (China)

  • Xuping Zhang, Nanjing University (China)

  • Feijun Song, Daheng Corporation (China)

  • Cunlin Zhang, Capital Normal University (China)

  • Yanting Lu, Nanjing University (China)

  • Yuejin Zhao, Beijing Institute of Technology (China)

  • Chunqing Gao, Beijing Institute of Technology (China)

  • Tiegen Liu, Tianjin University (China)

  • Xiaocong Yuan, Nankai University (China)

  • Weimin Chen, Chongqing University (China)

  • Zhongwei Fan, Academy of Optoelectronics (China)

  • Hanyi Zhang, Tsinghua University (China)

  • Lan Wu, Zhejiang University (China)

  • Yongsheng Zhang, University of Science and Technology of China (China)

  • Hong Yang, Peking University (China)

  • Xiaoying Li, Tianjin University (China)

  • Wei Xiong, Chinese Optical Society (China)

Conference Committee

Conference Chairs

  • Sen Han, University of Shanghai for Science and Technology (China) and Suzhou H&L Instruments LLC (China)

  • Toru Yoshizawa, Tokyo University of Agriculture and Technology (Japan) and 3D Associates (Japan)

  • Song Zhang, Purdue University (United States)

Conference Program Committee

  • Masato Aketagawa, Nagaoka University of Technology (Japan)

  • Yasuhiko Arai, Kansai University (Japan)

  • Xunde Bao, The University of Arizona (United States)

  • James H. Burge, College of Optical Sciences, The University of Arizona (United States)

  • Yuanshen Cao, National Institute of Measurement and Testing Technology (China)

  • Dong Chen, Bruker Nano Inc. (United States)

  • Garrett D. Cole, Crystalline Mirror Solutions GmbH (Austria)

  • Yuegang Fu, Changchun University of Science and Technology (China)

  • Qingying Jim Hu, QUEST Integrated, Inc. (United States)

  • Ming Jiang, Suzhou University of Science and Technology (China)

  • Zhihua Jiang, Shanghai Institute of Measurement and Testing Technology (China)

  • Kazuhide Kamiya, Toyama Prefectural University (Japan)

  • Katsuichi Kitagawa, Consultant (Japan)

  • Malgorzata Kujawinska, Warsaw University of Technology (Poland)

  • Chao-Wen Liang, National Central University (Taiwan)

  • Yuxiang Lin, ASML (United States)

  • Yasuhiro Mizutani, Osaka University (Japan)

  • Yukitoshi Otani, Utsunomiya University (Japan)

  • Giancarlo Pedrini, Institut für Technische Optik (Germany)

  • Xiang Peng, Shenzhen University (China)

  • Kemao Qian, Nanyang Technological University (Singapore)

  • Guohai Situ, Shanghai Institute of Optics and Fine Mechanics (China)

  • H. Philip Stahl, NASA Marshall Space Flight Center (United States)

  • John C. Stover, The Scatter Works Inc. (United States)

  • Takamasa Suzuki, Niigata University (Japan)

  • Toshitaka Wakayama, Saitama Medical University (Japan)

  • Xiangzhao Wang, Shanghai Institute of Optics and Fine Mechanics (China)

  • Jiangtao Xi, University of Wollongong (Australia)

  • Jing Xu, Tsinghua University (China)

  • Lianxiang Yang, Oakland University (United States)

  • Dawei Zhang, University of Shanghai for Science and Technology (China)

  • Hao Zhang, Tianjin University (China)

  • Heng Zhang, National Institute of Metrology (China)

  • Qican Zhang, Sichuan University (China)

  • Zonghua Zhang, Hebei University of Technology (China)

  • Ping Zhong, Donghua University (China)

  • Ping Zhou, The University of Arizona (United States)

  • Weihu Zhou, Academy of Opto-Electronics (China)

Session Chairs

  • 1 Optical Metrology Methods I

    Sen Han, University of Shanghai for Science and Technology (China)

  • 2 Optical Metrology Methods II

    Qican Zhang, Sichuan University (China)

  • 3 Optical Metrology Methods III

    Shouhong Tang, Suzhou H&L Instruments LLC (China)

  • 4 Optical Metrology Methods IV

    Shouhong Tang, Suzhou H&L Instruments LLC (China)

    Yuri V. Filatov, Saint Petersburg Electrotechnical University “LETI” (Russian Federation)

  • 5 Optical Metrology Methods V

    Wei-Tou Ni, University of Shanghai for Science and Technology (China)

    Zonghua Zhang, Hebei University of Technology (China)

  • 6 Optical Metrology Methods VI

    Yingjie Yu, Shanghai University (China)

    Chao Zuo, Nanjing University of Science and Technology (China)

  • 7 Optical Metrology Applications I

    Guohai Situ, Shanghai Institute of Optics and Fine Mechanics (China)

    Jun Ho Lee, Kongju National University (Korea, Republic of)

  • 8 Optical Metrology Applications II

    Shouhong Tang, Suzhou H&L Instruments LLC (China)

    Wei-Tou Ni, University of Shanghai for Science and Technology (China)

Introduction

These are the proceedings of the conference on Optical Metrology and Inspection for Industrial Applications IV that was held as part of SPIE/COS Photonics Asia (in Beijing, China, 12–14 October 2016). This conference focuses on methods, analysis, and applications of optical metrology and inspection that have been applied to various industries with a particular emphasis on the manufacturing industry. The field of optical metrology and inspection has rapidly grown to wide acceptance for many industrial applications. For example, the requirements from the absolute measurement of ultra-smooth flatness, industry realized high-speed and downsized measurement systems, and advances in machine/robot vision have provided smart algorithm systems, new lighting systems, and better ways of data transfer.

Non-contact methods based on optical interference and imaging principles have been seen wide use in the optical/mechanical engineering, semiconductor/LED and electronics industry, and also made advances in traditional manufacturing areas such as automotive and aerospace manufacturing. These methods are also being used for surface shape and defect inspection, and precision measurements. Recent computing power has made analysis methods such as phase-shifting a viable tool for fast on-line inspection for process control and metrology applications. This conference is intended to address the latest advances and future developments in the areas of optical metrology methods, applications and inspections as they are applied in various industries.

In these proceedings, papers submitted to the conference are presented in the following eight sessions: Optical Metrology Methods I to VI and Optical Metrology Applications I and II, and one Poster Session.

In addition to optical interference principles and techniques, imaging methods and phase-shifting analysis techniques have also become more and more popular in practical applications due to rapid advanced computational processing methods, camera systems and device technologies including various optoelectrical elements and devices. In the next conference scheduled in 2018, more papers are expected to be presented in those areas as well.

Sen Han

Toru Yoshizawa

Song Zhang

© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
} "Front Matter: Volume 10023", Proc. SPIE 10023, Optical Metrology and Inspection for Industrial Applications IV, 1002301 (9 January 2017); doi: 10.1117/12.2265117; https://doi.org/10.1117/12.2265117
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