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The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org. The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon. Please use the following format to cite material from these proceedings: Author(s), “Title of Paper,” in 32nd European Mask and Lithography Conference, edited by Uwe F.W. Behringer, Jo Finders, Proceedings of SPIE Vol. 10032 (SPIE, Bellingham, WA, 2016) Six-digit Article CID Number. ISSN: 0277-786X ISSN: 1996-786X (electronic ISBN: 9781510604872 ISBN: 9781510604889 (electronic) Published by SPIE P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time) · Fax +1 360 647 1445 SPIE.org Copyright © 2016, Society of Photo-Optical Instrumentation Engineers. Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of copying fees. The Transactional Reporting Service base fee for this volume is $18.00 per article (or portion thereof), which should be paid directly to the Copyright Clearance Center (CCC), 222 Rosewood Drive, Danvers, MA 01923. Payment may also be made electronically through CCC Online at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher. The CCC fee code is 0277-786X/16/$18.00. Printed in the United States of America. Publication of record for individual papers is online in the SPIE Digital Library.
Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a six-digit CID article numbering system structured as follows:
AuthorsNumbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B...0Z, followed by 10-1Z, 20-2Z, etc. Abegg, Erik, 0L Anthony, Ricky, 03 Baier, L., 0Q Banasch, M., 04 Becker, M., 0Q Bergeret, François, 0J Bolten, Jens, 0D Borde, M., 0P Bos, S., 0M Bottiglieri, Gerardo, 0B Bourgin, Y., 04 Buck, Peter, 0G Burbine, Andrew, 0N Chalom, Daniel, 05 Chaudhary, N., 06 Choi, Jin, 0E Choi, Yohan, 05 Colina, Alberto, 0B Dattilo, Davide, 07 de Winter, L., 0A Dietze, Uwe, 07 Dillon, Brian, 05 Eibelhuber, M., 0M Emoto, Keiji, 0E Fenger, Germain, 0N Ferstl, Berthold, 07 Finders, Jo, 0A, 0H Förthner, M., 0Q Frey, L., 0Q Fryer, David, 0N Geuzebroek, Douwe, 09 Giesecke, Anna Lena, 0D Green, Michael, 05 Ham, Young, 05 Han, Zhenxing, 07 Hayashi, Naoya, xvii Hertzsch, Tino, 02 Hiura, Hiromi, 0E Hudek, Peter, 05 Hur, Ik Boum, 05 Iida, Noriko, xvii Jurkovic, Michal, 05 Kamberian, Henry, 05 Kamo, Takashi, xvii Kasprowicz, Bryan, 05 Kiers, Ton, 0H Klikovits, Jan, 05 Kollmuss, M., 0Q Laforge, Elias, 03, 0O Lakcher, Amine, 0H Landis, S., 0M Last, Thorsten, 0A, 0B Laure, M., 0M Le Gratiet, Bertrand, 0H, 0J Leinse, Arne, 09 Lerch, Holger, 0D Luo, Y., 06 Lutich, Andrey, 02, 0K McCloskey, Paul, 03, 0O McMurran, Jeff, 05 Michel, F., 0Q Moll, Hans-Peter, 02 Morikawa, Yasutaka, xvii Nasalevich, Maxim, 0L Oetter, Günter, 07 O’Mathúna, Cian, 03, 0O Pain, L., 0M Paninjath, Sankaranarayanan, 0G Park, Joong Hee, 05 Park, Youngjin, 08 Pasqualini, F., 0P Pavlovic, Zoran, 0O Pereira, Mark, 0G Péter, Mária, 0L Porschatis, Caroline, 0D Prinzen, Andreas, 0D Rabot, Caroline, 0O Rispens, Gijsbert, 0B Rommel, M., 0Q Roule, O., 0P Rumler, M., 0Q Samayoa, Martin, 07 Sandstrom, Tor, 08 Savari, S. A., 06 Schatz, Jirka, 02 Schauer, V., 0M Schumacher, Karl, 0I Schumaker, Phil, 0E Seltmann, Rolf, 0I Soni, Rakesh Kumar, 0G Soual, Carole, 0J Steingrüber, R., 0C Sturtevant, John, 0N Takabayashi, Yukio, 0E Takai, Kosuke, xvii Takashima, Tsuneo, 0E Teyssedre, H., 0M Thanner, C., 0M vii viii Thwaite, Peter, 0G Utzny, Clemens, 0I, 0R van Adrichem, P., 0A van Brakel, R., 0F van der Zande, Wim, 0L van Ingen Schenau, Koen, 0B van Kerkhof, Joost, 09 van Schoot, Jan, 0B van Setten, Eelco, 0B van Zwol, Pieter Jan, 0L Vermeulen, Hans, 0L Verschuuren, M. A., 0F Vles, David, 0L Voorkamp, R., 0F Voorthuijzen, Pim, 0L Wahlbrink, Thorsten, 0D Wahlsten, Mikael, 08 Wang, Ningning, 0O Weichelt, T., 04 Weisbuch, François, 02 Wimplinger, M., 0M Zeitner, U. D., 04 Zhang, Z., 0C Zorbach, W., 0M Conference Committee
ForewordOn behalf of VDE/VDI-GMM, the sponsors, and the organizing committee, we would like to welcome you to the proceedings from the 32nd European Mask and Lithography Conference, EMLC2016, at the Hilton Hotel in Dresden, Germany. The conference has annually brought together scientists, researchers, engineers, and technologists from research institutes and companies from around the world to present innovations at the forefront of mask and wafer lithography. The two-day conference was dedicated to the science, technology, engineering and application of mask and lithography technologies and associated processes— giving an overview of the present status of mask and lithography technologies, while also providing future strategies where mask producers and users have the opportunity of becoming acquainted with new developments and results. This year’s sessions included: Mask Patterning, Metrology and Process, Wafer Lithography, EUV, Modelling and Computational Process Correction, Photonics, More than Moore, IoT and Manufacturing Challenges, Using the Data, Novel Approaches, and Nano-Imprint Lithography. Rutger Wijburg from Globalfoundries (Dresden) was the welcome speaker and first keynote speaker. He presented, “The Semiconductor Industry in Transition: A European Perspective.” The second keynote speaker was Naoya Hayashi from Dai Nippon Printing, Japan. His talk was titled, “Challenges and Prospects of Next Generation Masks” The status of the worldwide mask technologies.” The third keynote speaker was You Cao from ASML Brion Inc. (USA) who presented “Computational Lithography and Applications in Process Window Enhancement and Control.” On Monday morning, the Best Poster from BACUS 2015 was presented, followed by the Best Paper from PMJ 2016. Technical ExhibitionParallel to the conference presentations, a technical exhibition took place on Tuesday and Wednesday where companies (mask suppliers, material suppliers and equipment suppliers) presented their companies and products. To foster the exchange between the conference attendees and the exhibitors, the exhibition area was also the place for all coffee and lunch breaks. We hope that you enjoyed the technical sessions of the EMLC2016 as well as the technical exhibition, but also allowed yourself to visit the beautiful city of Dresden. Uwe F.W. Behringer EMLC2016 Program Chair |
