20 October 2016 A parallel multibeam mask writing method and its impact on data volumes
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Proceedings Volume 10032, 32nd European Mask and Lithography Conference; 1003206 (2016) https://doi.org/10.1117/12.2248449
Event: 32nd European Mask and Lithography Conference, 2016, Dresden, Germany
The pattern requirements for mask writers have steadily been growing, and there is considerable interest in multibeam mask writers to handle the throughput and resolution challenges associated with the needs of sub- 10nm technology nodes. The mask writer of the future will process terabits of information per second and deal with petabytes of data. In this paper, we investigate lossless data compression and system parallelism together to address part of the data transfer problem. We explore simple compression algorithms and the effect of parallelism on the total compressed data in a multibeam system architecture motivated by the IMS Nanofabrication multibeam mask writer series eMET. We model the shot assignment problem and beam shot overlap by means of two-dimensional linear spatial filtering on an image. We describe a fast scanning strategy and investigate data volumes for a family of beam arrays with 2N ×(2N −1) beams, where N is an odd integer.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
N. Chaudhary, Y. Luo, S. A. Savari, "A parallel multibeam mask writing method and its impact on data volumes", Proc. SPIE 10032, 32nd European Mask and Lithography Conference, 1003206 (20 October 2016); doi: 10.1117/12.2248449; https://doi.org/10.1117/12.2248449


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