High performance gratings for DFB lasers fabricated by direct-write e-beam lithography

R. Steingrüber; Z. Zhang

doi:10.1117/12.2248862

20 October 2016 High performance gratings for DFB lasers fabricated by direct-write e-beam lithography

R. Steingrüber, Z. Zhang

Proceedings Volume 10032, 32nd European Mask and Lithography Conference; 100320C (2016) https://doi.org/10.1117/12.2248862
Event: 32nd European Mask and Lithography Conference, 2016, Dresden, Germany

Abstract

The fabrication of high performance gratings for distributed feedback (DFB) lasers by direct-write (DW) electron-beam lithography (EBL) is presented. This paper starts with a short introduction of the grating theory and various types of gratings commonly used in DFB lasers, laying out resolution requirements and other fabrication challenges. The development and optimization process of the adopted EBL technology is then disclosed to address these challenges. In the end, the state-of-the-art laser performance is demonstrated, validating the technology and also paving ways for more advanced applications in the modern optical networks. We concentrate on grating fabrication technology of DFB lasers for telecommunication applications as the technology has been continuously developed at Fraunhofer Heinrich Hertz Institute (HHI) for more than two decades.

Citation Download Citation

R. Steingrüber and Z. Zhang "High performance gratings for DFB lasers fabricated by direct-write e-beam lithography", Proc. SPIE 10032, 32nd European Mask and Lithography Conference, 100320C (20 October 2016); https://doi.org/10.1117/12.2248862

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