20 October 2016 CD process control through machine learning
Author Affiliations +
Proceedings Volume 10032, 32nd European Mask and Lithography Conference; 100320R (2016) https://doi.org/10.1117/12.2248903
Event: 32nd European Mask and Lithography Conference, 2016, Dresden, Germany
Abstract
For the specific requirements of the 14nm and 20nm site applications a new CD map approach was developed at the AMTC. This approach relies on a well established machine learning technique called recursive partitioning. Recursive partitioning is a powerful technique which creates a decision tree by successively testing whether the quantity of interest can be explained by one of the supplied covariates. The test performed is generally a statistical test with a pre-supplied significance level. Once the test indicates significant association between the variable of interest and a covariate a split performed at a threshold value which minimizes the variation within the newly attained groups. This partitioning is recurred until either no significant association can be detected or the resulting sub group size falls below a pre-supplied level.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Clemens Utzny, Clemens Utzny, } "CD process control through machine learning ", Proc. SPIE 10032, 32nd European Mask and Lithography Conference, 100320R (20 October 2016); doi: 10.1117/12.2248903; https://doi.org/10.1117/12.2248903
PROCEEDINGS
9 PAGES


SHARE
Back to Top