Interface Scattering Of Light From Oxidized Copper Surfaces

A. Roos; M. Bergkvist; C. G. Ribbing

doi:10.1117/12.949170

21 March 1989 Interface Scattering Of Light From Oxidized Copper Surfaces

A. Roos, M. Bergkvist, C. G. Ribbing

Proceedings Volume 1009, Surface Measurement and Characterization; (1989) https://doi.org/10.1117/12.949170
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

Spectral structure in the diffuse reflectance of light from oxidized copper films on glass is reported. It has been experimentally verified that the growth of the oxide in the parent metal is essential for the development of interface roughness between the oxide and copper. This causes strong scattering of the reflected radiation. The scattering exhibits sepctral intensity variations which are oppositely phased to the regular interference pattern. It has been found that the diffuse reflectance scales very closely with the averaged electric field intensity at the oxide/metal interface. A model is presented, which is used to calculate diffuse reflectance spectra. It is shown that fitting of the calculated diffuse reflectance spectra to the experimental results gives quantitative information about the roughness of both interfaces. For oxidized copper films, excellent agreement has been found between the calculations and the values obtained by surface profilometry and TIS measurements on the bare copper film obtained after etching in hydrochloric acid.

Citation Download Citation

A. Roos, M. Bergkvist, and C. G. Ribbing "Interface Scattering Of Light From Oxidized Copper Surfaces", Proc. SPIE 1009, Surface Measurement and Characterization, (21 March 1989); https://doi.org/10.1117/12.949170

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