Surface Measurement And Characterization

Jean M. Bennett; Helen Vogele Gourley

doi:10.1117/12.949147

21 March 1989 Surface Measurement And Characterization

Jean M. Bennett, Helen Vogele Gourley

Proceedings Volume 1009, Surface Measurement and Characterization; (1989) https://doi.org/10.1117/12.949147
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

Sensitive and versatile measurement techniques have been developed to better characterize a wide variety of surfaces. These include sensitive optical noncontact and mechanical contact profilers, optical devices to measure area topography, profilers that can measure lengths up to 100 mm, and sensitive scatterometeis to measure small amounts of scattering from opaque and transparent materials. They can be used for characterizing, among others, high quality optical surfaces for applications in the infrared, visible, ultraviolet, extreme ultraviolet and x-ray regions, precision machined surfaces, and wafers used in the semiconductor industry. Fabrication shops can now have instruments for process control during manufacturing, so that smoother surfaces with less subsurface damage can be made. The ultrasensitive characterization techniques have also made possible experiments to better understand surface structure, ranging from atomic structure to macrostructural topography. The papers in this conference illustrate many of the latest developments in the area of surface characterization, and experiments performed using some of the specialized instrumentation.

Citation Download Citation

Jean M. Bennett and Helen Vogele Gourley "Surface Measurement And Characterization", Proc. SPIE 1009, Surface Measurement and Characterization, (21 March 1989); https://doi.org/10.1117/12.949147

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