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21 March 1989 X-UV And X-Ray Scattering Measurements From A Rough LiF Crystal Surface Characterized By Electron Micrography
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Proceedings Volume 1009, Surface Measurement and Characterization; (1989) https://doi.org/10.1117/12.949172
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany
Abstract
X-UV and X-ray scattering by a LiF crystal is measured. The angular distribution of the scattered radiation (ADSR) reveals characteristic features, side-peaks or asymmetry, The surface of the sample is statistically characterized by a microdensitometer analysis of electron micrographs resolving the short spatial wavelengths of the surface roughness. This analysis shows that the surface has a large microroughness with an autocovariance function which is gaussian in its initial portion. The first-order perturbation vector theory of the roughness-induced scattering leads to an interpretation of the ADSR features in terms of the modulation of the surface power spectral density function associated with the microroughness, by an optical factor. The possibility of obtaining short-scale roughness characterization from X-UV or X-ray measurements is discussed.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
N. Alehyane, M. Arbaoui, R. Barchewitz, J-M. Andre, F. E. Christensen, A. Hornstrup, J. Palmari, M. Rasigni, R. Rivoira, and G. Rasigni "X-UV And X-Ray Scattering Measurements From A Rough LiF Crystal Surface Characterized By Electron Micrography", Proc. SPIE 1009, Surface Measurement and Characterization, (21 March 1989); https://doi.org/10.1117/12.949172
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