Influence of the pulse duration and the experimental approach onto the specific removal rate for ultra-short pulses

B. Jaeggi; B. Neuenschwander; S. Remund; T. Kramer

doi:10.1117/12.2253696

20 February 2017 Influence of the pulse duration and the experimental approach onto the specific removal rate for ultra-short pulses

B. Jaeggi, B. Neuenschwander, S. Remund, T. Kramer

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Proceedings Volume 10091, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXII; 100910J (2017) https://doi.org/10.1117/12.2253696
Event: SPIE LASE, 2017, San Francisco, California, United States

Abstract

To be competitive in industrial applications the throughput is a key factor in laser micro machining using ultra-short pulsed laser systems. Both, ps and fs laser systems are suitable for industrial applications. Therefore one has to choose the right pulse duration for highest ablation efficiency. As shown in earlier publications the efficiency of the ablation process can be described by the specific removal rate, which has a maximum value at an optimum fluence. But its value often bases on a calculation using the threshold fluence and energy penetration depth deduced by measuring the depth of ablated cavities machined with different fluences and number of pulses. But this calculated specific removal rate often differs from the one deduced from ablated squares as recently shown in literature. Further an unexpected drop of the specific removal rate was reported for stainless steel when the pulse duration was reduced from 900 fs to 400 fs. Thus the influence of the pulse duration in the fs and low ps regime onto the specific removal rate is investigated with different methods for industrial relevant materials

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Citation Download Citation

B. Jaeggi, B. Jaeggi, B. Neuenschwander, B. Neuenschwander, S. Remund, S. Remund, T. Kramer, T. Kramer, "Influence of the pulse duration and the experimental approach onto the specific removal rate for ultra-short pulses", Proc. SPIE 10091, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXII, 100910J (20 February 2017); doi: 10.1117/12.2253696; https://doi.org/10.1117/12.2253696

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