22 May 2017 Front Matter: Volume 10091
This PDF file contains the front matter associated with SPIE Proceedings Volume 10091, including the Title Page, Copyright information, Table of Contents, Introduction (if any), and Conference Committee listing.

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

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Please use the following format to cite material from these proceedings:

Author(s), “Title of Paper,” in Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXII, edited by Beat Neuenschwander, Costas P. Grigoropoulos, Tetsuya Makimura, Gediminas Račiukaitis, Proceedings of SPIE Vol. 10091 (SPIE, Bellingham, WA, 2017) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510606234

ISBN: 9781510606241 (electronic)

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  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.


Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Afanasjev, Valentin, 1B

Akitsu, Tetsuya, 15

Ammann, Hubert, 0I

Asano, T., 06

Auyeung, Raymond C. Y., 02

Babin, Sergey A., 0L

Barkauskas, Jurgis, 04

Benetti, Marco, 0I

Bergner, K., 0G

Breckenfeld, Eric, 02

Charipar, Kristin M., 02

Charipar, Nicholas A., 02

Dostovalov, Alexandr V., 0L

Dudutis, Juozas, 0N

Eyama, Takashi, 0O

Flamm, D., 0G

Gecys, Paulius, 0N

Grishkanich, Alexsandr, 1B

Grossmann, D., 0G

He, Jiaji, 0K

Hirsch, Sören, 1B

Hu, Di, 0K

Huber, Heinz P., 0R

Hwang, David J., 05, 0B, 0D

Iakovlev, Alexey, 1B

Ikeda, A., 06

Ikenoue, H., 06

Indrišiūnas, Simonas, 0F

Ishizuka, Shogo, 1E

Jaeggi, Beat, 0I, 0J

Jebali, M. A., 19

Jitsuno, Takahisa, 15

Kablukov, Sergey I., 0L

Kaiser, M., 0G

Kamikawa-Shimizu, Yukiko, 1E

Kašalynas, Irmantas, 0F

Kato, Masaya, 15

Kim, Heungsoo, 02

Kleiner, J., 0G

Kogel-Hollacher, Markus, 0H

Kramer, T., 0J

Kuchik, Igor E., 08

Kuk, Seungkuk, 05

Kumkar, M., 0G

Lee, Woo Il, 0B

Longtin, Jon P., 0D

Lukša, Algimantas, 04

Mathews, Scott A., 02

Mayerhofer, Roland, 0Z

Minkevičius, Linas, 0F

Miyaji, Godai, 0T

Miyanaga, Noriaki, 1C

Miyazaki, Kenzo, 0T

Mukhin, Nikolay, 1B

Nakamura, D., 06

Nakata, Yoshiki, 1C

Narazaki, Aiko, 1C, 1E

Nargelienė, Viktorija, 04

Neuenschwander, Beat, 0I, 0J, 0S

Niaura, Gediminas, 04

Niino, Hiroyuki, 1E

Niki, Shigeru, 1E

Nishinaga, Jiro, 1E

Nolte, S., 0G

Oehler, Andreas, 0I

O'Neill, William, 0C

Osawa, Kazuhito, 1C

Pan, Heng, 0W

Park, Byung Kyu, 0B

Park, Jongmin, 05

Patel, Rajesh, 0X

Pichot, Jean Francois, 0H

Piqué, Alberto, 02

Račiukaitis, Gediminas, 0F, 0N

Rapp, Stephan, 0R

Redka, Dmitriy, 1B

Remund, Stefan, 0I, 0J

Romano, Valerio, 0S

Sato, Tadatake, 1E

Schmidt, Michael, 0R

Schoenleber, Martin, 0H

Schulze, Jochen, 0H

Shibata, Hajime, 1E

Shoji, Tatsuya, 1C

Shou, Wan, 0W

Šniaukas, Ramūnas, 0F

Sparkes, Martin, 0C

Suwa, A., 06

Takada, Hideyuki, 1E

Tao, Sha, 10

Ten, Jyi Sheuan, 0C

Terukov, Evgeniy, 1B

Tewolde, Mahder, 0D

Torizuka, Kenji, 1E

Trofimov, Vyacheslav A., 08

Trusovas, Romualdas, 04

Tsuboi, Yasuyuki, 1C

Tsuchiya, T., 06

Uno, Kazuyuki, 15

Voisiat, Bogdan, 0F

Wang, Anbo, 0K

Wang, Brian, 10

Wang, Zhen, 0B

Wassermann, Dominique, 0I

Winter, Jan, 0R

Wolf, Alexey A., 0L

Xuan, Haifeng, 0K

Yang, Shuo, 0K

Yoshida, Masataka, 1C

Zhang, Jie, 10

Zhang, Tao, 05, 0B, 0D

Zhang, Yiming, 0S

Zhao, Jay, 10

Zimmermann, F., 0G

Zlobina, Ekaterina A., 0L

Conference Committee

Symposium Chairs

  • Reinhart Poprawe, Fraunhofer-Institut für Lasertechnik (Germany)

  • Koji Sugioka, RIKEN (Japan)

Symposium Co-chairs

  • Guido Hennig, Daetwyler Graphics AG (Switzerland)

  • Yongfeng Lu, University of Nebraska-Lincoln (United States)

Program Track Chairs

  • Beat Neuenschwander, Berner Fachhochschule Technik und Informatik (Switzerland)

  • Henry Helvajin, The Aerospace Corporation (United States)

Conference Chairs

  • Beat Neuenschwander, Berner Fachhochschule Technik und Informatik (Switzerland)

  • Costas P. Grigoropoulos, University of California, Berkeley (United States)

  • Tetsuya Makimura, University of Tsukuba (Japan)

  • Gediminas Raciukaitis, Center for Physical Sciences and Technology (Lithuania)

Conference Program Committee

  • Craig B. Arnold, Princeton University (United States)

  • J. Thomas Dickinson, Washington State University (United States)

  • Jan J. Dubowski, Université de Sherbrooke (Canada)

  • Bo Gu, Bos Photonics (United States)

  • Henry Helvajian, The Aerospace Corporation (United States)

  • Sami T. Hendow, Adaptive Laser Processing (United States)

  • Guido Hennig, Daetwyler Graphics AG (Switzerland)

  • Heinz P. Huber, Hochschule für Angewandte Wissenschaften München (Germany)

  • Michel Meunier, Ecole Polytechnique de Montréal (Canada)

  • Yoshiki Nakata, Osaka University (Japan)

  • Hiroyuki Niino, National Institute of Advanced Industrial Science and Technology (Japan)

  • Alberto Piqué, U.S. Naval Research Laboratory (United States)

  • Andrei V. Rode, The Australian National University (Australia)

  • Stephan Roth, BLZ Bayerisches Laserzentrum GmbH (Germany)

  • Klaus Sokolowski-Tinten, Universität Duisburg-Essen (Germany) Razvan Stoian, Laboratoire Hubert Curien (France)

  • Koji Sugioka, RIKEN (Japan)

  • Xianfan Xu, Purdue University (United States)

  • Steven M. Yalisove, University of Michigan (United States)

Session Chairs

  • 1 Laser Processes I: Thin Films

    Beat Neuenschwander, Berner Fachhochschule Technik und Informatik (Switzerland)

  • 2 Laser Processes II: Production Technologies

    Costas P. Grigoropoulos, University of California, Berkeley (United States)

  • 3 Laser Processes III: Applications

    Tetsuya Makimura, University of Tsukuba (Japan)

  • 4 Enabling Throughput and Quality Scaling

    Gediminas Račiukaitis, Center for Physical Sciences and Technology (Lithuania)

  • 5 Nanostructured Optical Fibers: Joint Session with Conferences 10091 and 10094

    Roberto Osellame, CNR-Istituto di Fotonica e Nanotecnologie (Italy)

  • 6 Scribing Transparent Materials: Joint Session with Conferences 10091 and 10094

    Peter R. Herman, University of Toronto (Canada)

  • 7 Laser Interaction Dynamics: Joint Session with Conferences 10091 and 10094

    Guido Hennig, Daetwyler Graphics AG (Switzerland)

  • 8 Ultrafast Lasers for Characterization: Joint Session with Conferences 10091 and 10094

    Jean-Philippe Colombier, Université Jean Monnet Saint-Etienne (France)

  • 9 Laser Processing with Plasmonics: Joint Session with Conferences 10091 and 10093

    David B. Geohegan, Oak Ridge National Laboratory (United States)

  • 10 Laser Generated Nanostructures: Joint Session with Conferences 10091 and 10093

    Theobald Lohmueller, Ludwig-Maximilians-Universität München (Germany)

  • 11 Industrial Applications: Systems: Joint Session with Conferences 10091 and 10094

    Eric P. Mottay, Amplitude Systèmes (France)

  • 12 Industrial Applications: Processes: Joint Session with Conferences 10091 and 10094

    Malte Kumkar, TRUMPF Laser- und Systemtechnik GmbH (Germany)

© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
} "Front Matter: Volume 10091", Proc. SPIE 10091, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXII, 1009101 (22 May 2017); doi: 10.1117/12.2276097; https://doi.org/10.1117/12.2276097

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