7 March 2017 Front Matter: Volume 10092
This PDF file contains the front matter associated with SPIE Proceedings Volume 10092, including the Title Page, Copyright information, Table of Contents, Introduction (if any), and Conference Committee listing.

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

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Author(s), 'Title of Paper,” in Laser-based Micro- and Nanoprocessing XI, edited by Udo Klotzbach, Kunihiko Washio, Rainer Kling, Proceedings of SPIE Vol. 10092 (SPIE, Bellingham, WA, 2017) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510606258

ISBN: 9781510606265 (electronic)

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Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

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  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.


Numbers in the index correspond to the last two digits of the six-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first four digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Aalderink, Dennis, 04

Akkerman, H. B., 0I

Alal, Orhan, 1J

Alamri, Sabri, 14, 19

Albrecht, Hans-Stephan, 15

Ancona, Antonio, 0F

Angelini, A., 0A

Assaf, Youssef, 0X

B. S. Sampaio, Daniel J., 0E

Babin, Sergey A., 1H

Baselt, Tobias, 1T

Bayer, L., 1P

Bernard, Benjamin, 05

Bieda, Matthias, 11

Boarino, L., 0A

Bonse, Jörn, 0N

Bragin, Igor, 15

Braunschweig, Robert, 1W

Brodie, G. W. J., 1I

Brüning, Stephan, 1C

Budnicki, Aleksander, 04

Cai, Jinguang, 0P, 0Z

Canfield, Brian K., 1U

Chen, Min, 0R

Cherif, M., 1F

Datta, Anurup, 0U

Davis, Lloyd M., 1U

De Leo, N., 0A

Delmdahl, Ralph, 15

Descrovi, Emiliano, 0A

Diener, Romina, 0D

Dijoux, Mathieu, 1W

Dostovalov, Alexandr V., 1H

Ducharme, S., 1X

Dultsev, Fedor N., 1H

Eckhardt, Sebastian, 11

Ehrhardt, M., 1P

Er, Ali O., 1J, 21

Estival, Sébastien, 1W

Epperlein, Nadja, 0N

Faisst, Birgit, 04

Fassi, Irene, 0F

Faucon, Marc, 1G

Ferrarese Lupi, F., 0A

Fledderus, Henri, 0I, 0J

Fraggelakis, F., 13

Frascella, F., 0A

Friedrich Schilling, N., 0I

Gachot, Carsten, 11

Gemini, Laura, 1G

Gong, Qihuang, 0B

Graf, Thomas, 06

Grant, Byron, 1J, 21

Günther, Denise, 11

Gurevich, Evgeny L., 1D

Hans, Michael, 11

Hartmann, Peter, 1T

Hasegawa, Satoshi, 12

Haupt, Oliver, 15

Hayasaki, Yoshio, 12

Höhm, Sandra, 0N

Homburg, Oliver, 1C

Hoppius, Jan S., 1D

Hou, Tingxiu, 0R

Hu, Anming, 0R

Huang, X., 1X

Jarczynski, Manfred, 1C

Jin, J., 1I

Jonušauskas, Linas, 18

Jumel, J., 1F

Kabardiadi-Virkovski, Alexander, 1T

Kang, H., 1I

Kanitz, Alexander, 1D

Karaca, Haluk E., 1J, 21

Kawano, Hiroyuki, 07

Keramatnejad, K., 1X

Kholikov, Khomidkhodza, 1J, 21

Kietzig, Anne-Marie, 0X, 1R

Kirner, Sabrina V., 0N

Kling, Rainer, 13, 1F, 1G

Klotzbach, Udo, 0I, 0J

Korolkov, Victor P., 1H

Krüger, Jörg, 0N

Krupop, Benjamin, 14

Kuntze, Thomas, 0J

Kunze, Tim, 11, 14

Kupisiewicz, Axel, 1W

Lang, Valentin, 0T, 11

Lasagni, Andrés Fabián, 0T, 11, 14, 19, 1T

Laygue, Pierre, 1W

Li, D. W., 1X

Li, Peizhen, 1J, 21

Li, Ruozhou, 0R

Li, Yan, 0B

Liu, Lipu, 0B

Lopez, J., 13

Lorenz, P., 1P

Loumena, C., 1F

Lu, Y. F., 1X

Lv, Chao, 0P

MacMillan, F. J., 1I

Malinauskas, Mangirdas, 18

Manek-Hönninger, Inka, 13

Mangang, Melanie, 0E

Martin, Paul-Etienne, 1W

Martínez Vázquez, Rebeca, 0F

Matus, Luke, 1R

Matylitsky, Victor, 05

Maurer, Erich, 04

Midorikawa, Katsumi, 07

Minardi, Stefano, 0D

Mincuzzi, G., 13

Mitra, Thomas, 1C

Mücklich, Frank, 11

Nemykin, Anton V., 1H

Neugebauer, Christoph, 04

Nolte, Stefan, 0D

Okotrub, Konstantin A., 1H

Osellame, Roberto, 0F

Ostendorf, Andreas, 1D

Pfleging, Wilhelm, 0E, 0M, 0S

Pirani, F., 0A

Rabiee Golgir, H., 1X

Rakebrandt, J.-H., 0M, 0S

Rank, Andreas, 0T

Ricciardi, S., 0A

Rimselis, Gabrielius, 18

Rizzo, R., 0A

Roch, Teja, 11

Romoli, Luca, 1G

Rosenfeld, Arkadi, 0N

Rosenkranz, Andreas, 11

Rößler, Florian, 14

Salem, A., 0I

Scholz, Steffen G., 0E

Seifert, H. J., 0M, 0S

Serien, Daniela, 07

Seyitliyev, Dovletgeldi, 1J, 21

Sima, Felix, 07

Simpson, M. C., 1I

Smyrek, P., 0M, 0S

Song, J. F., 1X

Spaltmann, Dirk, 0N

Sugioka, Koji, 07

Tabacchi, Gloria, 0D

Taleb Ali, M., 1F

Terentiev, Vadim S., 1H

Thomas, Zachary, 1J

Trinh, Kim E., 11

Trotta, Gianluca, 0F

Varapnickas, Simonas, 18

Volpe, Annalisa, 0F

Wang, Shutong, 0R

Watanabe, Akira, 0P, 0Z

Weber, Rudolf, 06

Wollmann, Philipp, 0J

Wu, Dong, 07

Xu, Jian, 07

Xu, Xianfan, 0U

Yang, Dong, 0B

Yang, Hong, 0B

Yoshiki, Keisuke, 1K

Yu, Yongchao, 0R

Zagoranskiy, I., 1P

Zahedi, Ehsan, 06

Zhang, Qian, 0B

Zheng, Y., 0M, 0S

Zhou, Y. S., 1X

Zimmer, K., 1P

Zwahr, Christoph, 14

Conference Committee

Symposium Chairs

  • Reinhart Poprawe, Fraunhofer-Institut für Lasertechnik (Germany)

  • Koji Sugioka, RIKEN (Japan)

Symposium co-Chairs

  • Guido Hennig, Daetwyler Graphics AG (Switzerland)

  • Yongfeng Lu, University of Nebraska-Lincoln (United States)

Program Track Chairs

  • Beat Neuenschwander, Berner Fachhochschule Technik und Informatik (Switzerland)

  • Henry Helvajin, The Aerospace Corporation (United States)

Conference Chair

  • Udo Klotzbach, Fraunhofer IWS Dresden (Germany)

Conference Co-chairs

  • Kunihiko Washio, Paradigm Laser Research Ltd. (Japan)

  • Rainer Kling, ALPhANOV (France)

Conference Program Committee

  • Antonio Ancona, CNR-Istituto di Fotonica e Nanotecnologie (Italy)

  • Arkadiusz J. Antonczak, Wroclaw University of Technology (Poland)

  • Craig B. Arnold, Princeton University (United States)

  • Jiyeon Choi, Korea Institute of Machinery & Materials (Korea, Republic of)

  • Francois Courvoisier, Université de Franche-Comté (France)

  • Chunlei Guo, University of Rochester (United States)

  • Miguel Holgado Bolaños, Universidad Politécnica de Madrid (Spain)

  • Minghui Hong, National University of Singapore (Singapore)

  • Andrés-Fabián Lasagni, TU Dresden (Germany)

  • Yongfeng Lu, University of Nebraska-Lincoln (United States)

  • Yoshiki Nakata, Osaka University (Japan)

  • Andreas E. H. Oehler, Lumentum (Switzerland)

  • Yasuhiro Okamoto, Okayama University (Japan)

  • Wilhelm Pfleging, Karlsruhe Institute of Technology (Germany)

  • Martin Sharp, Liverpool John Moores University (United Kingdom)

  • Barbara Stadlober, JOANNEUM RESEARCH Forschungsgesellschaft mbH (Austria)

  • Razvan Stoian, Laboratoire Hubert Curien (France)

  • Koji Sugioka, RIKEN (Japan)

  • Hong-Bo Sun, Jilin University (China)

  • Jorma Vihinen, Tampere University of Technology (Finland)

  • Akira Watanabe, Tohoku University (Japan)

  • Michael J. Withford, Macquarie University (Australia)

  • Xianfan Xu, Purdue University (United States)

  • Haibin Zhang, Electro Scientific Industries, Inc. (United States)

  • Haiyan Zhao, Tsinghua University (China)

Session Chairs

  • 1 Laser Micro Structuring and Processing I

    Udo Klotzbach, Fraunhofer IWS Dresden (Germany)

  • 2 Laser Micro Structuring and Processing II

    Jiyeon Choi, Korea Institute of Machinery & Materials (Korea, Republic of)

  • 3 Laser Micro Structuring and Processing III

    Rainer Kling, ALPhANOV (France)

  • 4 Advanced Laser Structuring for Energy Storage and Conversion I

    Wilhelm Pfleging, Karlsruhe Institute of Technology (Germany)

  • 5 Laser Nano Structuring and Processing

    Andrés-Fabián Lasagni, TU Dresden (Germany)

  • 6 Advanced Laser Structuring for Energy Storage and Conversion II

    Haibin Zhang, Electro Scientific Industries, Inc. (United States)

  • 7 Direct Write Processing, Ablation, and Surface Modification I

    Kunihiko Washio, Paradigm Laser Research Ltd. (Japan)

  • 8 Large Area Micro/Nano Structuring, Laser Interference Patterning I

    Chunlei Guo, University of Rochester (United States)

    Yongfeng Lu, University of Nebraska-Lincoln (United States)

  • 9 Large Area Micro/Nano Structuring, Laser Interference Patterning II

    Antonio Ancona, CNR-Istituto di Fotonica e Nanotecnologie (Italy)

  • 10 High Speed Laser Beam Engineering Systems for High Power Ultra Short Pulsed Laser

    Yasuhiro Okamoto, Okayama University (Japan)

  • 11 Direct Write Processing, Ablation, and Surface Modification II

    Akira Watanabe, Tohoku University (Japan)


Research in laser-based micro- and nanoprocessing has great potential for a broad range of application across various sectors including mechanical engineering, photonics and electrical engineering, vehicle and aerospace component manufacturing, and other functional device manufacturing industries. Furthermore, both the medical device and biotechnology industries benefit from micro- and nanoprocessing components to enter new markets for the coming years.

The conference “Laser-based Micro- and Nanoprocessing XI” (for historical reasons, LBMP XI for short) was held 31 January – 2 February, as a part of LASE 2017 at Photonics West in San Francisco, California, United States. This volume contains both invited and contributed papers from Austria, Belgium, Brazil, Canada, China, France, Germany, Italy, Japan, Lithuania, Netherlands, New Zealand, Romania, the Russian Federation, Sweden, and the United States.

Our conference focused on transitioning research and development results into different applications. We saw increasing demand for innovations in nano- and microsystem technologies, beam propagation and shaping to support product development in mechanical engineering, photonics and electrical engineering, bio- and medical device engineering industries, etc. Laser technology in particular offered great potential with ultrashort pulse lasers and highly dynamic and high-speed laser beam control systems for a diverse range of applications.

We would like to highlight innovations in processing including large area micro/nano structuring, laser interference patterning, roll-to-roll processing, hybrid additive and subtractive processing, direct write processing, ablation and surface modification, such as for high performances energy-storage devices, flexible photovoltaics and wearable smart electronic devices, etc.

With the global micro-technology companies increasingly focused on biomedical device products, the biomedical/health industry sector remain for many the primary target market. The trend toward ever more miniaturized systems continues; and the technical possibilities with laser-based micro- and nanoprocessing still offer much room to be exploited to move ideas toward products.

For example, solutions were offered to create micro- and nano-biomimetic structures for cell migration studies. These structures were fabricated by hybrid subtractive and additive 3D femtosecond laser processing or high throughput laser texturing of antibacterial surfaces on steel or implants.

We would like to express our deepest gratitude to the program committee members and the SPIE technical staff for their great efforts during planning and organization of LBMP XI. We would also like to thank the invited speakers and presenters of the contributed papers for their contribution to the success of this conference.

Udo Klotzbach

Kunihiko Washio

Rainer Kling

© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
} "Front Matter: Volume 10092", Proc. SPIE 10092, Laser-based Micro- and Nanoprocessing XI, 1009201 (7 March 2017); doi: 10.1117/12.2276119; https://doi.org/10.1117/12.2276119

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