Lasing of metamorphic hybrid 1300nm spectral band VCSEL under optical pumping up to 120 C

N. V. Kryzhanovskaya; E. I. Moiseev; A. G. Gladyshev; L. Ya. Karachinsky; I. I. Novikov; A. V. Babichev; S. A. Blokhin; M. A. Bobrov; Yu. M. Zadiranov; S. I. Troshkov; A. Yu. Egorov

doi:10.1117/12.2250542

22 February 2017 Lasing of metamorphic hybrid 1300nm spectral band VCSEL under optical pumping up to 120 °C

N. V. Kryzhanovskaya, E. I. Moiseev, A. G. Gladyshev, L. Ya. Karachinsky, I. I. Novikov, A. V. Babichev, S. A. Blokhin, M. A. Bobrov, Yu. M. Zadiranov, S. I. Troshkov, A. Yu. Egorov

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Proceedings Volume 10098, Physics and Simulation of Optoelectronic Devices XXV; 1009811 (2017) https://doi.org/10.1117/12.2250542
Event: SPIE OPTO, 2017, San Francisco, California, United States

Abstract

The ability to create metamorphic hybrid heterostructure of 1300 nm spectral band VCSEL is demonstrated. Metamorphic semiconductor part of heterostructure with GaAs/AlGaAs DBR and InAlGaAs/InGaAs QW active region has been grown by molecular beam epitaxy (MBE) on GaAs (100). Top dielectric SiO₂/Ta₂O₅ DBR is made by the magnetron sputtering method. VCSEL has been studied under optical pumping (λ = 532 nm, diameter of the focused laser beam of ~ 1 μm) by using micro-PL setup in the range of optical pump power 0 – 70 mW at room temperature. Presence of the superlinear PL intensity growth having threshold-like dependence of PL integral intensity together with the PL peaks narrowing and mode composition modification with the pumping density increasing could be attributed to lasing behavior of the structure. Obtained results indicate the opportunity to use metamorphic growth on GaAs substrates for the 1300 nm range VCSEL manufacturing.

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N. V. Kryzhanovskaya, E. I. Moiseev, A. G. Gladyshev, L. Ya. Karachinsky, I. I. Novikov, A. V. Babichev, S. A. Blokhin, M. A. Bobrov, Yu. M. Zadiranov, S. I. Troshkov, and A. Yu. Egorov "Lasing of metamorphic hybrid 1300nm spectral band VCSEL under optical pumping up to 120 °C", Proc. SPIE 10098, Physics and Simulation of Optoelectronic Devices XXV, 1009811 (22 February 2017); https://doi.org/10.1117/12.2250542

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