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20 February 2017 Selective-area growth of InAs nanowire arrays on Si3N4/Si(111) by molecular beam epitaxy
K. Zhang, V. Ray, P. Herrera-Fierro, J. R. Sink, F. Toor, J. P. Prineas
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Proceedings Volume 10114, Quantum Dots and Nanostructures: Growth, Characterization, and Modeling XIV; 1011419 (2017) https://doi.org/10.1117/12.2267737
Event: SPIE OPTO, 2017, San Francisco, California, United States
Abstract
InAs nanowires directly integrated on Si platform show great promise in fabricating next generation mid-infrared optoelectronic devices. In this study we demonstrated the growth of catalyst-free, selective-area InAs nanowire arrays on electron beam patterned Si3N4/Si(111) by molecular beam epitaxy. Growth parameters were studied, and nanowire growth kinetics dependence on patterned mask opening diameter and interwire distance was investigated. Under certain growth conditions, nanowire diameter was found to be relatively independent of nanohole diameter and pitch. We also realized the growth of randomly-nucleated, self-assembled nanowires on Si(111) and investigated the temperature, flux influence on nanowire morphology.
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K. Zhang, V. Ray, P. Herrera-Fierro, J. R. Sink, F. Toor, and J. P. Prineas "Selective-area growth of InAs nanowire arrays on Si3N4/Si(111) by molecular beam epitaxy", Proc. SPIE 10114, Quantum Dots and Nanostructures: Growth, Characterization, and Modeling XIV, 1011419 (20 February 2017); https://doi.org/10.1117/12.2267737
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KEYWORDS
Silicon
Indium arsenide
Nanowires
Molecular beam epitaxy
Crystals
Electron beam lithography
Scanning electron microscopy
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