Presentation + Paper
20 February 2017 Nonlinear polymer/quantum dots nanocomposite for two-photon nanolithography of photonic devices
Author Affiliations +
Abstract
In this paper we report on fabrication of a nanocomposite based on CdSe quantum dots mixed with commercial photoresist ORMOCOMP and proved its high structurability by direct laser writing. The distribution of quantum dots was visualised by transmission electron microscopy and the quality and geometrical parameters of the structures were studied by optical and atomic force microscopy. We manufactured a novel photonic device for Bloch surface electromagnetic waves in photonic crystals and thoroughly studied their propagation by both leakage microscopy and back focal plane imaging methods. By z-scan method we measured the nonlinear Kerr coefficient of quantum dots. Its high value makes the manufactured photonic device promising for all-optical switching applications.
Conference Presentation
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ksenia A. Abrashitova, Dmitry N. Gulkin, Natalia G. Kokareva, Kirill R. Safronov, Artem S. Chizhov, Alexander A. Ezhov, Vladimir O. Bessonov, and Andrey A. Fedyanin "Nonlinear polymer/quantum dots nanocomposite for two-photon nanolithography of photonic devices", Proc. SPIE 10115, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X, 1011510 (20 February 2017); https://doi.org/10.1117/12.2253179
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Photonic devices

Photoresist materials

Nanocomposites

Polymers

Switching

Prisms

Quantum dots

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