20 February 2017 Reaction of photochemical resists used in screen printing under the influence of digitally modulated ultra violet light
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Abstract
Different chemical photo-reactive emulsions are used in screen printing for stencil production. Depending on the bandwidth, optical power and depth of field from the optical system, the reaction / exposure speed has a diverse value. In this paper, the emulsions get categorized and validated in a first step.

After that a mathematical model gets developed and adapted due to heuristic experience to estimate the exposure speed under the influence of digitally modulated ultra violet (UV) light. The main intention is to use the technical specifications (intended wavelength, exposure time, distance to the stencil, electrical power, stencil configuration) in the emulsion data sheet primary written down with an uncertainty factor for the end user operating with large projector arc lamps and photo films.

These five parameters are the inputs for a mathematical formula which gives as an output the exposure speed for the Computer to Screen (CTS) machine calculated for each emulsion / stencil setup. The importance of this work relies in the possibility to rate with just a few boundaries the performance and capacity of an exposure system used in screen printing instead of processing a long test series for each emulsion / stencil configuration.
Conference Presentation
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T. Gmuender, "Reaction of photochemical resists used in screen printing under the influence of digitally modulated ultra violet light", Proc. SPIE 10117, Emerging Digital Micromirror Device Based Systems and Applications IX, 1011705 (20 February 2017); doi: 10.1117/12.2247720; https://doi.org/10.1117/12.2247720
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