In-Process Control Of Specific Thin Film Properties In Large Scale Dc-Reactive Sputtering Machines

Sabine Muller; Gunter Brauer; Wilfried Dicken; Eberhard SchultheiB; Peter Wirz

doi:10.1117/12.949326

10 March 1989 In-Process Control Of Specific Thin Film Properties In Large Scale Dc-Reactive Sputtering Machines

Sabine Muller, Gunter Brauer, Wilfried Dicken, Eberhard SchultheiB, Peter Wirz

Proceedings Volume 1012, In-Process Optical Measurements; (1989) https://doi.org/10.1117/12.949326
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

For DC-reactive magnetron sputtering of different dielectric materials control algorithms have been derived to stabilize the discharge in the transition region between metallic and reactive mode. On-line measurement technology has been integrated to the large scale production machine concept to compensate long time effects and guarantee high reproducibility.

Citation Download Citation

Sabine Muller, Gunter Brauer, Wilfried Dicken, Eberhard SchultheiB, and Peter Wirz "In-Process Control Of Specific Thin Film Properties In Large Scale Dc-Reactive Sputtering Machines", Proc. SPIE 1012, In-Process Optical Measurements, (10 March 1989); https://doi.org/10.1117/12.949326

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