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10 March 1989 In-Process Control Of Specific Thin Film Properties In Large Scale Dc-Reactive Sputtering Machines
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Proceedings Volume 1012, In-Process Optical Measurements; (1989) https://doi.org/10.1117/12.949326
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany
Abstract
For DC-reactive magnetron sputtering of different dielectric materials control algorithms have been derived to stabilize the discharge in the transition region between metallic and reactive mode. On-line measurement technology has been integrated to the large scale production machine concept to compensate long time effects and guarantee high reproducibility.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sabine Muller, Gunter Brauer, Wilfried Dicken, Eberhard SchultheiB, and Peter Wirz "In-Process Control Of Specific Thin Film Properties In Large Scale Dc-Reactive Sputtering Machines", Proc. SPIE 1012, In-Process Optical Measurements, (10 March 1989); https://doi.org/10.1117/12.949326
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