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10 March 1989 Investigation Of Optical Surfaces With A New, Automated Ellipsometer Arrangement
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Proceedings Volume 1012, In-Process Optical Measurements; (1989)
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany
The new automatic PSZ-ellipsometer to be presented here is derived from known PSA/PSCA-arrangements. The usage of a double-beam polarizer for analyzing the reflected beam and of a new evaluation technique allow the compensation of main error sources. With the absolutely necessary optical elements only, our concept allows measurements with high precision, although a quasidynamic method is used. The actually presented realization is designed for measurements at multiple angles of incidence and wavelengths (MAI spectroscopic ellipsometry). The measuring process is dynamically computer guided for optimum performance. Our application is mainly the investigation of surface layers, not only for evaporated thin film coatings, but also for surface modifications due to polishing or cleaning processes. Instant experimental tests gave errors much less than 0.001 in refractive index and *lnm in film thickness while measuring MgF2 films on BK 7 glass. Investigations of "polishing films" resolved differen-ces in refractive indices between surface and substrate of only 0.0018 *0.0004 on BK 7 glass.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael Linder "Investigation Of Optical Surfaces With A New, Automated Ellipsometer Arrangement", Proc. SPIE 1012, In-Process Optical Measurements, (10 March 1989);

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