5 May 2017 Front Matter: Volume 10143
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 10143, including the Title Page, Copyright information, Table of Contents, Introduction (if any), and Conference Committee listing.
Panning and Goldberg: Front Matter: Volume 10143

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Author(s), “Title of Paper,” in Extreme Ultraviolet (EUV) Lithography VIII, edited by Eric M. Panning, Kenneth A. Goldberg, Proceedings of SPIE Vol. 10143 (SPIE, Bellingham, WA, 2017) Seven-digit Article CID Number.

ISSN: 0277-786X

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ISBN: 9781510607378

ISBN: 9781510607385 (electronic)

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Authors

Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Abe, Tamotsu, 1J, 2G

Ackerman, Christian, 0W

Adam, Kostas, 16

Adelmann, Christoph, 0L

Anderson, Chris, 0N

Arnold, John C., 0Y, 1D, 1G

Asai, Masaya, 1Z

Ayothi, Ramakrishnan, 1D, 1G

Baert, R., 18

Bailey, Todd, 2B

Barouch, Eytan, 1P

Beique, Genevieve, 1G

Bekaert, Joost P., 0H, 18, 1E

Benschop, Jos, 0G

Beral, Christophe, 0R

Bhattarai, Suchit, 2C

Biafore, John J., 2B

Bilski, Bartosz, 0D

Blanco Carballo, Victor M., 0H, 0I, 0U, 14, 18, 21

Bonam, Ravi, 0K, 1A

Bosker, Jan-Willem, 0D

Brainard, Robert L., 09, 0W

Brendler, Andy, 2B

Breton, Mary, 1A

Bristol, Robert L, 0Z

Broman, Par, 0D

Brouwer, Albert (Fred) M., 0A, 25

Brunner, Timothy A., 0E, 13, 1F

Buitrago, Elizabeth, 0Q, 0T

Burkhardt, Martin, 12

Capelli, Renzo, 0J, 0K

Carcasi, Michael, 29

Carlos, Fonseca, 15

Castellanos, Sonia, 0A

Chalykh, Roman, 06

Chan, BT, 0U

Chandonait, Jonathan, 0B

Chen, Xuemei, 0E, 0F, 1F

Chen, Yulu, 0K, 1S

Chi, Cheng, 1D

Cho, Maenghyo, 2E

Choi, Joonmyung, 2E

Choi, Suhyeong, 21

Chuang, Steven, 19

Chunder, Anindarupa, 2B

Ciofi, Ivan, 0I, 18

Clifford, Chris, 16

Colsters, Paul, 0H

Corliss, Daniel, 0K

Custers, Rolf, 0T, 23

De Gendt, Stefan, 24

De Schepper, Peter, 1E

De Silva, Anuja, 0Y, 1D, 1G

De Simone, Danilo, 0R, 0U, 1E, 23, 24

de Winter, L., 11

Decoster, Stefan, 0H

Delorme, Maxence, 1E

Demand, Marc, 26

Denbeaux, Gregory, 0B, 0W

Derks, Paul, 0Q, 23

Deutz, Alex, 1N

Di Lorenzo, Paolo, 0H, 15

Dietzel, Martin, 0J

Dixit, Girish, 19

Dredonx, Jeannot, 0G

Drissi, Y., 14

Durrant, Danielle, 0Y

D’urzo, Lucia, 0U

Dusa, Mircea, 18, 19

Earley, William, 09

Edrisi, Arash, 10

Ekinci, Yasin, 09, 0A, 0Q, 0T, 0V, 1O, 1Q, 25

Enomoto, Masashi, 26

Erdmann, Andreas, 10

Evangelista, Fabrizio, 0D

Evanschitzky, Peter, 10

Fallica, Roberto, 0A, 0T

Farrell, Richard, 1D

Felix, Nelson, M., 0F, 0K, 0Y, 1D, 1G

Fenger, Germain, 16

Fernández Herrero, Analía, 0P

Finders, Jo, 0G, 0Q, 11

Fliervoet, T., 18

Flynn, Tracy, 0W

Fonseca, Carlos, 15

Foubert, Philippe, 0R, 0U, 26

Franke, Joern-Holger, 0H

Freedman, Daniel A., 09

Frommhold, Andreas, 0V

Fumar-Pici, Anita, 1E

Furukawa, Tsuyoshi, 1D, 1G

Gabor, Allen, 0E, 0F, 1F

Gallagher, Emily E., 0H, 0L, 14, 18

Gallagher, M., 18

Gao, Weimin, 0I

Giannelis, Emmanuel P., 08

Gillijns, Werner, 14, 18, 1E

Goodwin, Francis, 0K, 1S

Greer, Michael, 1E

Grzeskowiak, Steven, 0B, 0W

Gullikson, Eric, 1S

Guo, Jing, 1D

Haase, Anton, 0P

Haitjema, Jarich, 0A, 25

Halder, S., 18

Hamieh, Bassem, 1G

Han, Geng, 13

Han, Seulgi, 1G

Hara, Arisa, 15

Harada, Tetsuo, 22

Harm, Greg, 19

Harumoto, Masahiko, 1Z

Heil, Tilmann, 0G

Helfenstein, Patrick, 1O, 1Q

Hellweg, Dirk, 0J, 0K

Hendrickx, Eric, 0H, 0I, 10, 18

Hermans, Jan, 19

Hetel, Iulian, 0U

Hetzer, Dave, 0Y

Higgins, Craig, 0E

Hoefnagels, Rik, 0Q, 0T, 23

Hollemans, Christiaan, 1N

Hollink, T., 18

Hontake, Koichi, 0Y

Hooker, Kevin, 1C

Hori, Tsukasa, 1J, 2G

Hosler, Erik, 0F

Hotalen, Jodi, 09

Hsu, Stephen, 11, 20

Huang, Huai, 1A

Hubbard, Alex, 0Y

Huli, Lior, 0Y

Huyghebaert, Cedric, 0L

Hwang, Jeong-Gu, 1U

Hwang, Myungsoo, 06

Ichinomiya, Hiroshi, 26

Irmscher, Mathias, 10

Iseki, Tomohiro, 29

Jasper, Hans, 0D

Jeon, Jinho, 06

Jeong, Changyoung, 2E

Jiang, Jing, 23

Johnson, Richard, 0F, 0Y

Kadoi, Mikio, 27

Kaiser, Winfried, 0G

Kamei, Yuya, 26

Kamohara, Itaru, 0I

Kandel, Yudhishthir, 0B

Kaneyama, Koji, 1Z

Kasahara, Kazuki, 08

Kawakami, Shinichiro, 0Y, 26

Kawasuji, Yasufumi, 1J, 2G

Kazarian, Aram, 1C

Kazazis, Dimitrios, 25

Kerkhof, Peter, 1N

Kiers, Ton, 0H, 15

Kim, Byung-Hun, 1U

Kim, Guk-Jin, 1P, 1U, 1V

Kim, Heebom, 2E

Kim, Hocheol, 06

Kim, Hoyeon, 06

Kim, Hyunwoo, 06

Kim, In-Seon, 1P, 1U, 1V

Kim, Insung, 06

Kim, Jungyeop, 06

Kim, Min-Su, 1V

Kim, Muyoung, 2E

Kim, R. Ryoung-Han, 0H, 0I, 14, 18, 21

Kim, Seong-Sue, 06

Kneer, Bernhard, 0G

Koch, Markus, 0J

Kocsis, Michael, 1E

Kodama, Takeshi, 1J, 2G

Koike, Kyohei, 15

Kosma, Vasiliki, 08

Koster, Norbert, 1N

Krabbendam, Peter, 0G

Krysak, Marie E., 0Z

Kubis, Michael, 19

Kutrzeba Kotowska, Bogumila, 0H, 18

Kye, Jongwook, 1S

Lam, Michael, 16

Larivière, Stéphane, 0H, 18

Last, Thorsten, 0D, 11

Latypov, Azat, 2B

Laubis, Christian, 0P, 10

Lazzarino, Frederic, 0H, 0R, 18

Lee, Byunghoon, 2E

Lee, Donggun, 06

Lee, Jae Uk, 0L, 21

Lee, Joe, 1G

Lee, Seungkoo, 06

Lee, Siyong, 06

Lee, Sook, 1E

Lemley, Corey, 0Y

Lenderink, Egbert, 0D

Leray, Philippe, 0H, 18

Levasier, Leon, 0D

Levinson, Harry J., 1Y, 2B

Levinson, Zac, 1W

Liang, Andrew, 19

Liang, Chen-Wei, 19

Liu, Chi-Chun (Charlie), 1A, 1D

Loopstra, Erik, 0G

Lucas, Kevin, 1C

Luong, Kim Vu, 10

Lyons, Adam, 1E

Mack, Chris A., 0E

Mallik, A., 18

Mangat, Pawitter, 0K, 1T

Mao, Ming, 0H, 0R, 18

Marokkey, Sajan, 0B

Maslow, Mark John, 0H, 15

Matham, Shravan, 0K

Matsumoto, Yoko, 27

Matsunaga, Koichi, 0Y

McClelland, Alexandra L., 0V, 28

McGeoch, Malcolm W., 2K

McIntyre, Greg, 0H, 14, 18

Meeuwissen, Marieke, 0Q, 0T, 23

Meiling, Hans, 0G

Meli, Luciana, 0Y, 1D, 1G

Melvin, Lawrence S., 0B, 0I

Meyer-Ilse, Julia, 1S

Meyers, Sheldon, 0F

Migura, Sascha, 0G

Mika, Niclas, 0G

Minami, Yoichi, 27

Minekawa, Yukie, 29

Miyakawa, Ryan, 0N

Mizoguchi, Hakaru, 1J, 2G

Mochi, Iacopo, 0T, 1O, 1Q

Mohacsi, Istvan, 1O

Molkenboer, Freek, 1N

Montgomery, Warren, 28

Moon, Junghwan, 2E

Muilwijk, Pim, 1N

Mulckhuyse, Wouter, 1N

Murphy, Michael, 09

Murray, Cody, 0Y

Muthinti, Raja, 1A

Na, Jihoon, 06

Naasz, Sandra, 10

Nafus, Kathleen, 26

Nagahara, Seiji, 29

Nagai, Tomoki, 29

Nakagawa, Hisashi, 29

Nakajima, Makoto, 1H

Nakarai, Hiroaki, 1J, 2G

Nam, Seok-Woo, 06

Narasimhan, Amrit, 0W

Naruoka, Takehiko, 29

Naulleau, Patrick P., 0M, 0N, 17, 20, 2C

Natori, Sakurako, 15

Neureuther, Andrew R., 0M, 17, 20, 2C

Nijland, Björn, 1N

No, Hee-Ra, 1U

Nowak, Krzysztof M., 1J, 2G

Ober, Christopher K., 08

Odent, Jeremy, 08

Oh, Hye-Keun, 1P, 1U, 1V

Oh, Taehwan, 1G

Okamoto, Takeshi, 2G

Okazaki, Shinji, 1J, 2G

Oostdijck, Bastiaan, 1N

Oshima, Akihiro, 29

Oyama, Kenichi, 15

Ozlem, Melih, 13

Painter, Benjamin, 0B

Panici, Gianluca, 2I

Paolillo, S., 18

Park, Changmin, 06

Park, Jin-Goo, 1V

Park, Jinhong, 06

Park, Joo-On, 06

Patlolla, Raghuveer, 1A

Peeters, Rudy, 0D

Perlitz, Sascha, 0J, 0K

Petrillo, Karen, 0Y, 1G

Pflüger, Mika, 0P

Philipsen, Vicky, 0I, 10

Pieczulewski, Charles, 1Z

Pirati, Alberto, 0G

Pistor, Thomas V., 17

Pollentier, Ivan, 0L

Popescu, Carmen, 0V

Qerimi, Dren, 2I

Qi, Zhengqing John, 1S, 1Y

Raghavan, Praveen, 0U

Raghunathan, Ananthan, 16

Rajendran, Rajeev, 1O, 1Q

Raley, Angelique, 1D

Rankin, Jed, 0K, 13, 1F, 1S, 1Y

Reddy, Sirish, 19

Reuter, Christian, 10

Rio, David, 19, 1E

Rispens, Gijsbert, 0Q, 0T, 23

Robinson, Alex P. G., 0V, 28

Roth, John, 0V, 28

Rusu, P., 18

Ruzic, David N., 2I

Saad, Yves, 0I

Saitou, Takashi, 1J, 2G

Sakamoto, Rikimaru, 1H

Samudrala, Pavan, 0F

Saulnier, Nicole, 1A, 1G

Sayan, Safak, 0U

Schmidt, Kristin, 1D

Scholze, Frank, 0P, 10

Sekiguchi, Atsushi, 22, 27

Seshadri, Indira, 1A, 1D, 1G

Shamma, Nader, 19

Shearer, Jefferey C., 1A, 1G

Shehzad, Atif, 0R

Sherazi, Y., 18

Sherwin, Stuart, 17

Shibayama, Wataru, 1H

Shigaki, Shuhei, 1H

Shin, Youngsoo, 21

Shiozawa, Takahiro, 26

Shiraishi, Gosuke, 29

Shiraishi, Yutaka, 1J, 2G

Shite, Hideo, 26

Sieg, Stuart, 1A

Singh, Lovejeet, 1D, 1G

Singh, SherJang, 1T

Singhal, Akhil, 19

Sizyuk, Tatyana, 2J

Smith, Bruce W., 1W

Socha, Robert, 20

Soltwisch, Victor, 0P

Souriau, Laurent, 10

Stamm, Uwe, 0G

Stoeldraijer, Judon, 0G

Stokes, Harold, 1Z

Stowers, Jason K., 1E

Sun, Lei, 0E, 1G, 1S, 1Y

Tagawa, Seiichi, 29

Takahashi, Seiji, 27

Takeda, Satoshi, 1H

Tan, L. E., 14, 18

Tan, Samantha, 19

Tanaka, Hiroshi, 1J, 2G

Tanaka, Yuji, 1Z

Tasdemir, Zuhal, 0T

Taylor, Ron, 1T

te Sligte, Edwin, 1N

Thuering, Bernd, 0G

Timmermans, Marina, 0L

Timoshkov, Vadim, 0H, 15

Tran, Timothy, 19

Trivkovic, D., 14, 18

Troost, Kars, 0G

Truang, Hoa, 1D

Turley, Christina, 1F

Tuttle, Josh, 1C

Ure, David, 28

van Adrichem, P., 11

van Ballegoij, Rob, 0G

van de Kerkhof, Mark, 0D, 11

van de Kruijs, Robbert W. E., 10

Van Den Heuvel, Dieter, 0R

van der Walle, Peter, 1N

van Dijk, Joep, 0H

van Es, Roderik, 0D

van Oosten, Anton, 0Q

van Putten, Michel, 1N

van Schoot, Jan, 0G

van Schravendijk, Bart, 19

van Setten, Eelco, 0G

Vandenberghe, Geert, 0R, 0U

Vandereyken, Jelle, 19

Vanelderen, Pieter, 0U

Verduijn, Erik, 0K, 13

Vesters, Yannick, 0R, 24

Viatkina, Katja, 19

Vockenhuber, Michaela, 09, 0Q, 0T, 25

Wallow, Thomas I., 1E

Wan, D., 18

Wang, Yow-Gwo, 0M, 20

Ward, Brandon, 19

Watanabe, Takeo, 22, 27

Watanabe, Yukio, 1J, 2G

Westerhout, Jeroen, 1N

Wiaux, Vincent, 0I

Wise, Rich, 19

Wittebrood, Friso, 0H, 11, 18

Wood, Obert R., 0K, 13, 1S, 1T

Wu, Lianjia, 0A

Wuister, Sander, 0Q

Xiao, Guangming, 1C

Xu, Dongbo, 10

Xu, Hong, 08

Yaegashi, Hidetami, 15

Yamada, Tsuyoshi, 1J

Yamato, Masatoshi, 15

Yamauchi, Shohei, 15

Yamazaki, Taku, 1J, 2G

Yan, Qiliang, 0B

Yanagida, Tatsuya, 1J

Yatzor, Brett, 1T

Yeung, Michael, 1P, 1V

Yildirim, Oktay, 0Q, 0T, 23

Yoshihara, Kosuke, 29

Yoshitake, Shusuke, 1O, 1Q

Yu, Jengyi, 19

Zahedmanesh, Houman, 0L

Zdravkov, Alexander, 0D

Zhang, Yu, 25

Zhang, Yunqiang, 1C

Zhou, Xibin, 1C

Conference Committee

Symposium Chair

  • Bruce W. Smith, Rochester Institute of Technology (United States)

Symposium Co-Chair

  • Will Conley, Cymer, An ASML Company (United States)

    Conference Chair

  • Eric M. Panning, Intel Corporation (United States)

Conference Co-Chair

  • Kenneth A. Goldberg, Lawrence Berkeley National Laboratory (United States)

Conference Program Committee

  • Markus Bender, Advanced Mask Technology Center GmbH Company KG (Germany)

  • Jos P. Benschop, ASML Netherlands B.V. (Netherlands)

  • Robert L. Brainard, SUNY CNSE/SUNYIT (United States)

  • Martin Burkhardt, IBM Thomas J. Watson Research Center (United States)

  • Deniz Elizabeth Civay, GLOBALFOUNDRIES Inc. (United States)

  • Daniel A. Corliss, IBM Corporation (United States)

  • Yasin Ekinci, Paul Scherrer Institut (Switzerland)

  • Nelson M. Felix, IBM Corporation (United States)

  • Emily E. Gallagher, IMEC (Belgium)

  • Florian Gstrein, Intel Corporation (United States)

  • Naoya Hayashi, Dai Nippon Printing Company, Ltd. (Japan)

  • Eric Hendrickx, IMEC (Belgium)

  • Soichi Inoue, Toshiba Corporation (Japan)

  • Bryan S. Kasprowicz, Photronics, Inc. (United States)

  • Insung Kim, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

  • Seong-Sue Kim, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

  • Ted Liang, Intel Corporation (United States)

  • Chang-Moon Lim, SK Hynix, Inc. (Korea, Republic of)

  • Anna Lio, Intel Corporation (United States)

  • Lawrence S. Melvin III, Synopsys, Inc. (United States)

  • Hiroaki Morimoto, Toppan Printing Company, Ltd. (Japan)

  • Patrick P. Naulleau, Lawrence Berkeley National Laboratory (United States)

  • Christopher S. Ngai, Applied Materials, Inc. (United States)

  • Shinji Okazaki, Gigaphoton Inc. (Japan)

  • Jan Hendrik Peters, Carl Zeiss SMS GmbH (Germany)

  • Jorge J. Rocca, Colorado State University (United States)

  • Kurt G. Ronse, IMEC (Belgium)

  • Tsutomu Shoki, HOYA Corporation (Japan)

  • Akiyoshi Suzuki, Gigaphoton Inc. (Japan)

  • Anna Tchikoulaeva, Lasertec U.S.A., Inc. Zweigniederlassung Deutschland (Germany)

  • Thomas I. Wallow, ASML Brion (United States)

  • Obert R. Wood II, GLOBALFOUNDRIES Inc. (United States)

  • Anthony Yen, Taiwan Semiconductor Manufacturing Company Ltd. (Taiwan, China)

Session Chairs

  • 1 Keynote Session

    Eric M. Panning, Intel Corporation (United States)

    Kenneth A. Goldberg, Lawrence Berkeley National Laboratory (United States)

  • 2 EUV Materials I: Metal-Based EUV Resists: Joint Session with Conferences 10146 and 10143

    Thomas I. Wallow, ASML Brion (United States)

    Robert L. Brainard, SUNY CNSE/SUNYIT (United States)

  • 3 EUV Materials II: Fundamentals I: Joint Session with Conferences 10146 and 10143

    Clifford L. Henderson, Georgia Institute of Technology (United States)

    Anna Lio, Intel Corporation (United States)

  • 4 Tutorial Session: Joint Session with Conferences 10143 and 10146

    Eric M. Panning, Intel Corporation (United States)

    Kenneth A. Goldberg, Lawrence Berkeley National Laboratory (United States)

  • 5 Integration

    Jos P. Benschop, ASML Netherlands B.V. (Netherlands)

    Daniel A. Corliss, IBM Corporation (United States)

  • 6 EUV Mask Inspection and Imaging: Joint Session with Conferences 10143 and 10145

    Anna Tchikoulaeva, Lasertec U.S.A., Inc. Zweigniederlassung Deutschland (Germany)

    Ofer Adan, Applied Materials, Ltd. (Israel)

  • 7 EUV Optics and Pellicle

    Patrick P. Naulleau, Lawrence Berkeley National Laboratory (United States)

    Yasin Ekinci, Paul Scherrer Institut (Switzerland)

  • 9 Resist Advances and Integration

    Robert Bristol, Intel Corporation (United States)

    Nelson M. Felix, IBM Corporation (United States)

  • 10 Resist Modeling

    Thomas I. Wallow, ASML Brion (United States)

    Christopher S. Ngai, Applied Materials, Inc. (United States)

  • 11 Masks I

    Emily E. Gallagher, IMEC (Belgium)

    Obert R. Wood II, GLOBALFOUNDRIES Inc. (United States)

  • 12 Masks II

    Malahat Tarassasoli, Intel Corporation (United States)

    Naoya Hayashi, Dai Nippon Printing Company, Ltd. (Japan)

  • 13 Patterning I

    Soichi Inoue, Toshiba Corporation (Japan)

    Bryan S. Kasprowicz, Photronics, Inc. (United States)

  • 14 Patterning II

    Martin Burkhardt, IBM Thomas J. Watson Research Center (United States)

    Thomas Scherise, Carl Zeiss SMT GmbH (Germany)

  • 15 Source

    Akiyoshi Suzuki, Gigaphoton Inc. (Japan)

    Jos P. Benschop, ASML (United States)

© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
} "Front Matter: Volume 10143", Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 1014301 (5 May 2017); doi: 10.1117/12.2279234; https://doi.org/10.1117/12.2279234
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