Pattern defect reduction and LER improvement of chemo-epitaxy DSA process

Makoto Muramatsu; Takanori Nishi; Gen You; Yusuke Saito; Yasuyuki Ido; Noriaki Oikawa; Toshikatsu Tobana; Kiyohito Ito; Shinya Morikita; Takahiro Kitano

doi:10.1117/12.2257952

21 March 2017 Pattern defect reduction and LER improvement of chemo-epitaxy DSA process

Makoto Muramatsu, Takanori Nishi, Gen You, Yusuke Saito, Yasuyuki Ido, Noriaki Oikawa, Toshikatsu Tobana, Kiyohito Ito, Shinya Morikita, Takahiro Kitano

Author Affiliations +

Proceedings Volume 10144, Emerging Patterning Technologies; 101440Q (2017) https://doi.org/10.1117/12.2257952
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

Directed self-assembly (DSA) has been investigated over the past few years as the candidate for next generation lithography. Especially, sub 20nm line and space patterns obtained by chemo-epitaxy process are expected to apply to DRAM active area, Logic fin and narrow metal patterns. One of the biggest advantages of DSA lines is that the pattern pitch is decided by the specific factors of the block copolymer, and it indeed the small pitch walking as a consequence. However, the generating mechanism of the DSA pattern defect is still not cleared^1-4 and the line edge roughness (LER) is not overtaken self- aligned quadruple patterning (SAQP).

In this report, we present the latest results regarding the defect reduction and LER improvement work regarding chemoepitaxy line and space pattern. In addition, we introduce the result of application of chemical epitaxy process to hole pattern.

Conference Presentation

Citation Download Citation

Makoto Muramatsu, Makoto Muramatsu, Takanori Nishi, Takanori Nishi, Gen You, Gen You, Yusuke Saito, Yusuke Saito, Yasuyuki Ido, Yasuyuki Ido, Noriaki Oikawa, Noriaki Oikawa, Toshikatsu Tobana, Toshikatsu Tobana, Kiyohito Ito, Kiyohito Ito, Shinya Morikita, Shinya Morikita, Takahiro Kitano, Takahiro Kitano, } "Pattern defect reduction and LER improvement of chemo-epitaxy DSA process", Proc. SPIE 10144, Emerging Patterning Technologies, 101440Q (21 March 2017); doi: 10.1117/12.2257952; https://doi.org/10.1117/12.2257952

ACCESS THE FULL ARTICLE

PERSONAL SIGN IN
Full access may be available with your subscription

Email or Username Forgot your username?

Password Forgot your password?

Show

Remember Email/Username on this computer

Remember Password

No SPIE account? Create an account
or Institutional Sign In via Shibboleth

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $14.40

Non-members: $18.00 ADD TO CART

Show All Keywords

Keywords/Phrases

Search In:

Publication Years