In this report, we present the latest results regarding the defect reduction and LER improvement work regarding chemoepitaxy line and space pattern. In addition, we introduce the result of application of chemical epitaxy process to hole pattern.
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Makoto Muramatsu, Takanori Nishi, Gen You, Yusuke Saito, Yasuyuki Ido, Noriaki Oikawa, Toshikatsu Tobana, Kiyohito Ito, Shinya Morikita, Takahiro Kitano, "Pattern defect reduction and LER improvement of chemo-epitaxy DSA process," Proc. SPIE 10144, Emerging Patterning Technologies, 101440Q (21 March 2017);