28 March 2017 Sub-wavelength transmission and reflection mode tabletop imaging with 13nm illumination via ptychography CDI
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Abstract
EUV lithography is promising for addressing upcoming, <10nm nodes for the semiconductor industry, but with this promise comes the need for reliable metrology techniques. In particular, there is a need for actinic mask inspection in which the imaging wavelength matches that of the intended lithography process, so that the most relevant defects are detected. Here, we demonstrate tabletop, ptychographic, coherent diffraction imaging (CDI) in reflection- and transmission-modes of extended samples, using a 13 nm high harmonic generation (HHG) source. We achieve the first sub-wavelength resolution EUV image (0.9λ) in transmission, the highest spatial resolution using any 13.5 nm source to date. We also present the first reflection-mode image obtained on a tabletop using 12.7 nm light. This work represents the first 12.7 nm reflection-mode image using any source of a general sample.
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Michael Tanksalvala, Christina L. Porter, Dennis F. Gardner, Michael Gerrity, Giulia F. Mancini, Xiaoshi Zhang, Galen P. Miley, Elisabeth R. Shanblatt, Benjamin R. Galloway, Charles S. Bevis, Robert Karl, Daniel A. Adams, Henry C. Kapteyn, Margaret M. Murnane, "Sub-wavelength transmission and reflection mode tabletop imaging with 13nm illumination via ptychography CDI", Proc. SPIE 10145, Metrology, Inspection, and Process Control for Microlithography XXXI, 101450L (28 March 2017); doi: 10.1117/12.2271386; https://doi.org/10.1117/12.2271386
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