28 March 2017 Lab- and field-test results of MFIG, the first real-time vacuum-contamination sensor
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Abstract
To produce high-end semiconductor products, clean vacuum is often required. Even small amounts of high-mass molecules can reduce product yield. The challenge is to timely detect the presence of relevant contaminants. This is where MFIG can help. The mass-filtered ion gauge sensor (MFIG) continuously and selectively monitors the presence of high-mass contaminant molecules with a sensitivity down to 1E-13 mbar at total pressures up to 1E-5 mbar. This contribution presents laboratory and field-test data to demonstrate the capabilities of the latest version of the MFIG sensor in continuously and selectively detecting high-mass contaminant molecules in (U)HV vacuum.
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Diederik Maas, Diederik Maas, Pim Muilwijk, Pim Muilwijk, Michel van Putten, Michel van Putten, Frank de Graaf, Frank de Graaf, Olaf Kievit, Olaf Kievit, Patrique Boerboom, Patrique Boerboom, Norbert B. Koster, Norbert B. Koster, } "Lab- and field-test results of MFIG, the first real-time vacuum-contamination sensor ", Proc. SPIE 10145, Metrology, Inspection, and Process Control for Microlithography XXXI, 101452I (28 March 2017); doi: 10.1117/12.2258230; https://doi.org/10.1117/12.2258230
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