Nanoimprint lithography using gas permeable template

Makoto Hanabata; Satoshi Takei; Shinya Nakajima; Naoto Sugino; Yoko Matsumoto; Atsushi Sekiguchi

doi:10.1117/12.2257095

Translator Disclaimer

27 March 2017 Nanoimprint lithography using gas permeable template

Makoto Hanabata, Satoshi Takei, Shinya Nakajima, Naoto Sugino, Yoko Matsumoto, Atsushi Sekiguchi

Author Affiliations +

Proceedings Volume 10146, Advances in Patterning Materials and Processes XXXIV; 101461I (2017) https://doi.org/10.1117/12.2257095
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

Cracked gasses generated from imprinted materials and/or involved solvents cause transcriptional defects on template materials and insufficient filling of imprinted materials in nanoimprint lithography. This study aims to create the novel gas permeable nanoimprint template materials to prevent such defects caused by cracked gasses and involved solvents. A biomass based template was investigated in thermal and UV nanoimprint lithography instead of the conventional template such as quartz, PMDS, DLC, block copolymers. The line patterning results using the biomass based gas permeable template in nanoimprint lithography were better to reduce the line pattern failure compared with that of quartz based template as a reference. Gas transmission coefficient was evaluated for template materials having thermal crosslinkable urethane groups. The proposed nanoimprint lithography using biomass based gas permeable template is one of the most promising processes ready to be investigated for mass-production of fine device applications.

Citation Download Citation

Makoto Hanabata, Satoshi Takei, Shinya Nakajima, Naoto Sugino, Yoko Matsumoto, and Atsushi Sekiguchi "Nanoimprint lithography using gas permeable template", Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101461I (27 March 2017); https://doi.org/10.1117/12.2257095

ACCESS THE FULL ARTICLE