27 March 2017 Effects of phenolic compound addition to fractionated Novolak-based resists to improve resolution capability(2)
Author Affiliations +
Abstract
Novolak resists have been widely used in IC production and are used to this day in the production of flat panel displays (FPDs) and MEMS. However, with the advent of high-definition devices, FPDs must meet growing requirements for finer dimensions. These trends have generated requirements for higher sensitivity, higher resolution, and wider process margins for novolak resists. Using a lithography simulator with the goal of improving the performance of novolak resists, we examined various approaches to improving resist materials. This report discusses efforts to improve resolution and to broaden process margins using a novolak resin that exhibits a higher degree of fractionation than in the previous report (maximum fractionated resin) with the addition of low molecular weight phenol resins.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Atsushi Sekiguchi, Atsushi Sekiguchi, Yoko Matsumoto, Yoko Matsumoto, Yoshihisa Sensu, Yoshihisa Sensu, Satoshi Takei, Satoshi Takei, Makoto Hanabata, Makoto Hanabata, Hatsuyuki Tanaka, Hatsuyuki Tanaka, } "Effects of phenolic compound addition to fractionated Novolak-based resists to improve resolution capability(2)", Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101461K (27 March 2017); doi: 10.1117/12.2257548; https://doi.org/10.1117/12.2257548
PROCEEDINGS
11 PAGES


SHARE
Back to Top