DSA process window expansion with novel DSA track hardware

Masahiko Harumoto; Harold Stokes Jr.; Yuji Tanaka; Koji Kaneyama; Chalres Pieczulewski; Masaya Asai; Maxime Argoud; Isabelle Servin; Gaëlle Chamiot-Maitral; Guillaume Claveau; Raluca Tiron; Ian Cayrefourcq

doi:10.1117/12.2257945

27 March 2017 DSA process window expansion with novel DSA track hardware

Masahiko Harumoto, Harold Stokes Jr., Yuji Tanaka, Koji Kaneyama, Chalres Pieczulewski, Masaya Asai, Maxime Argoud, Isabelle Servin, Gaëlle Chamiot-Maitral, Guillaume Claveau, Raluca Tiron, Ian Cayrefourcq

Author Affiliations +

Proceedings Volume 10146, Advances in Patterning Materials and Processes XXXIV; 101461X (2017) https://doi.org/10.1117/12.2257945
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

PS-b-PMMA block copolymer is a well-known DSA material, and there are many DSA patterning methods that make effective the use of such 1st generation materials. Consequently, this variety of patterning methods opens a wide array of possibilities for DSA application[1-4]. Last year, during the inaugural International DSA Symposium, researchers and lithographers concurred on common key issues for DSA patterning methods such as: defect density, LWR, placement error, etc. Defect density was specifically expressed as the biggest obstacle for new processes. Coat-Develop track systems contribute to the DSA pattern fabrication and also influence the DSA pattern performances[4]. In this study, defectivity was investigated using an atmosphere-controlled chamber on the SOKUDO DUO track. As an initial step for expanding the DSA process window, fingerprint patterns were used for various atmospheric conditions during DSA self-assembly annealing. In this study, we will demonstrate an improved DSA process window, and then we will discuss the mechanism for this atmospheric effect.

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Masahiko Harumoto, Harold Stokes Jr., Yuji Tanaka, Koji Kaneyama, Chalres Pieczulewski, Masaya Asai, Maxime Argoud, Isabelle Servin, Gaëlle Chamiot-Maitral, Guillaume Claveau, Raluca Tiron, and Ian Cayrefourcq "DSA process window expansion with novel DSA track hardware", Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101461X (27 March 2017); https://doi.org/10.1117/12.2257945

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