27 March 2017 DSA process window expansion with novel DSA track hardware
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PS-b-PMMA block copolymer is a well-known DSA material, and there are many DSA patterning methods that make effective the use of such 1st generation materials. Consequently, this variety of patterning methods opens a wide array of possibilities for DSA application[1-4]. Last year, during the inaugural International DSA Symposium, researchers and lithographers concurred on common key issues for DSA patterning methods such as: defect density, LWR, placement error, etc. Defect density was specifically expressed as the biggest obstacle for new processes. Coat-Develop track systems contribute to the DSA pattern fabrication and also influence the DSA pattern performances[4]. In this study, defectivity was investigated using an atmosphere-controlled chamber on the SOKUDO DUO track. As an initial step for expanding the DSA process window, fingerprint patterns were used for various atmospheric conditions during DSA self-assembly annealing. In this study, we will demonstrate an improved DSA process window, and then we will discuss the mechanism for this atmospheric effect.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masahiko Harumoto, Masahiko Harumoto, Harold Stokes, Harold Stokes, Yuji Tanaka, Yuji Tanaka, Koji Kaneyama, Koji Kaneyama, Chalres Pieczulewski, Chalres Pieczulewski, Masaya Asai, Masaya Asai, Maxime Argoud, Maxime Argoud, Isabelle Servin, Isabelle Servin, Gaëlle Chamiot-Maitral, Gaëlle Chamiot-Maitral, Guillaume Claveau, Guillaume Claveau, Raluca Tiron, Raluca Tiron, Ian Cayrefourcq, Ian Cayrefourcq, } "DSA process window expansion with novel DSA track hardware", Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101461X (27 March 2017); doi: 10.1117/12.2257945; https://doi.org/10.1117/12.2257945

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