27 March 2017 Development of mass production technology for block copolymer lithographic materials
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We have successfully synthesized various and over wide range molecular weight block copolymers (BCPs): these are polystyrene(PS)-polymethylmethacrylate(PMMA) as general components and poly(4-trimethylsilylstyrene)(PTMSS)- poly(4-hydroxystyrene)(PHS) system as very strong segregated components (high chi) and multiblock type of those copolymers which form the microphase-separated structure pattern using living anionic polymerizing method by which the size of polymer can be precisely controlled. In addition, we were able to observe alternating lamellar and cylinder structures which were formed by our various BCPs using small angle X-ray scattering (SAXS). Moreover, we have successfully developed new apparatus for high volume manufacturing including our original technologies such as purification of monomer, improvement of wetted surface, and mechanical technology for high vacuum. And we have successfully synthesized all the BCPs with narrow molecular weight distribution (PDI <1.1) with large-scale apparatus.
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Toshiyuki Himi, Toshiyuki Himi, Ryota Matsuki, Ryota Matsuki, Terumasa Kosaka, Terumasa Kosaka, Ryosuke Ogaki, Ryosuke Ogaki, Yukio Kawaguchi, Yukio Kawaguchi, Tetsuo Shimizu, Tetsuo Shimizu, } "Development of mass production technology for block copolymer lithographic materials", Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101461Z (27 March 2017); doi: 10.1117/12.2258167; https://doi.org/10.1117/12.2258167

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