27 March 2017 Study of flowability effect on self-planarization performance at SOC materials
Author Affiliations +
For multilayer process, importance of carbon-based spin-on hardmask material that replaces amorphous carbon layer (ACL) is ever increasing. Carbon-based spin-on hardmask is an organic polymer with high carbon content formulated in organic solvents for spin-coating application that is cured through baking. In comparison to CVD process for ACL, carbon-based spin-on hardmask material can offer several benefits: lower cost of ownership (CoO) and improved process time, as well as better gap-fill and planarization performances. Thus carbon-based spin-on hardmask material of high etch resistance, good gap-fill properties and global planarization performances over various pattern topographies are desired to achieve the fine patterning and high aspect ratio (A/R). In particular, good level of global planarization of spin coated layer over the underlying pattern topographies is important for self-aligned double patterning (SADP) process as it dictates the photolithographic margin. Herein, we report a copolymer carbon-based spin-on hardmask resin formulation that exhibits favorable film shrinkage profile and good etch resistance properties. By combining the favorable characteristics of each resin – one resin with good shrinkage property and the other with excellent etch resistance into the copolymer, it was possible to achieve a carbonbased spin-on hardmask formulation with desirable level of etch resistance and the planarization performances across various underlying substrate pattern topographies.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Huichan Yun, Huichan Yun, Jinhyung Kim, Jinhyung Kim, Youjung Park, Youjung Park, Yoona Kim, Yoona Kim, Seulgi Jeong, Seulgi Jeong, Jaeyeol Baek, Jaeyeol Baek, Byeri Yoon, Byeri Yoon, Sanghak Lim, Sanghak Lim, } "Study of flowability effect on self-planarization performance at SOC materials", Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 1014624 (27 March 2017); doi: 10.1117/12.2257880; https://doi.org/10.1117/12.2257880

Back to Top