27 March 2017 Development of high heat resistant polyphenols applied to the spin-on carbon hardmask
Author Affiliations +
Abstract
In this paper, we report on new polyphenols synthesized by the condensation compounds of phenols and aldehydes. The phenols were 4,4'-biphenol, 2,6-dihydroxynaphthalene and 2,7-dihydroxynaphthalene. The aldehydes were 4- phenylbenzaldehyde and 4,4'-biphenyldicarbaldehyde. And we evaluated basic properties for the Spin-On Carbon Hardmask [1]. We recognized 4,4'-biphenol was showed good applicability to the best raw material of the phenols for polyphenol, and 2,6-dihydroxynaphthalene was showed good applicability to better raw material for polyphenol than 2,7-dihydroxynaphthalene. 4,4'-biphenyldicaraldehyde was better raw material of the aldehydes for polyphenols than 4- phenylbenzaldehyde, in solubility. As for heat resistance, 2,6-dihydroxynaphthalene was the best raw material of the phenols for polyphenols, 2,7-dihydroxynaphthalene was better raw material for polyphenols than 4,4'-biphenol. However, NF7177 synthesized by the condensation of 4,4’-biphenol and 4-phenylbenzaldehyde and NF7A78 synthesized by the condensation of 4,4'-biphenol and 4,4'-biphenyldicarbaldehyde seem to be crosslinking by heating, whence the heat resistance of the polyphenols using 4,4'-biphenol might be improved by optimizing heating condition. These materials are low molecular weight of less than 1000, so we expected having good planarization and gap filling.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tomoaki Takigawa, Junya Horiuchi, Naoya Uchiyama, Kana Okada, Yoko Shimizu, Takashi Makinoshima, Takashi Sato, Masatoshi Echigo, "Development of high heat resistant polyphenols applied to the spin-on carbon hardmask", Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 1014626 (27 March 2017); doi: 10.1117/12.2257975; https://doi.org/10.1117/12.2257975
PROCEEDINGS
7 PAGES


SHARE
Back to Top