24 March 2017 Scanner-to-scanner CD analysis and control in an HVM environment
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Abstract
Shrinking pattern sizes dictate that scanner-to-scanner variations for HVM products shrink proportionally. This paper shows the ability to identify (a subset of) root causes for mismatch between ArF immersion scanners using scanner metrology. The root cause identification was done in a Samsung HVM factory using a methodology (Proximity Matching Budget Breakdown or PromaBB) developed by ASML. The proper identification of root causes-1 helps to select what combination of scanner control parameters should be used to reduce proximity differences of critical patterns while minimizing undesirable side effects from cross-compensation. Using PromaBB, the difference between predicted and measured CD mismatch was below 0.2nm. PromaBB has been proposed for HVM implementation at Samsung in combination with other ASML fab applications: Pattern Matcher Full Chip (PMFC), Image Tuner and FlexWave.
Conference Presentation
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Du Hyun Beak, Du Hyun Beak, Ju Hee Shin, Ju Hee Shin, Tony Park, Tony Park, Dong Kyeng Han, Dong Kyeng Han, Jin Phil Choi, Jin Phil Choi, Jeong Heung Kong, Jeong Heung Kong, Young Seog Kang, Young Seog Kang, Se Yeon Jang, Se Yeon Jang, Peter Nikolsky, Peter Nikolsky, Chris Strolenberg, Chris Strolenberg, Noh-Kyoung Park, Noh-Kyoung Park, Khalid Elbattay, Khalid Elbattay, Vito Tomasello, Vito Tomasello, Austin Peng, Austin Peng, Anand Guntuka, Anand Guntuka, Zhao-Ze Li, Zhao-Ze Li, Ronald Goossens, Ronald Goossens, Machi Ryu, Machi Ryu, Jangho Shin, Jangho Shin, Chung-Yong Kim, Chung-Yong Kim, Andrew Moe, Andrew Moe, Yun-A Sung, Yun-A Sung, } "Scanner-to-scanner CD analysis and control in an HVM environment", Proc. SPIE 10147, Optical Microlithography XXX, 101470A (24 March 2017); doi: 10.1117/12.2258339; https://doi.org/10.1117/12.2258339
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