Scanner-to-scanner CD analysis and control in an HVM environment

Du Hyun Beak; Ju Hee Shin; Tony Park; Dong Kyeng Han; Jin Phil Choi; Jeong Heung Kong; Young Seog Kang; Se Yeon Jang; Peter Nikolsky; Chris Strolenberg; Noh-Kyoung Park; Khalid Elbattay; Vito Tomasello; Austin Peng; Anand Guntuka; Zhao-Ze Li; Ronald Goossens; Machi Ryu; Jangho Shin; Chung-Yong Kim; Andrew Moe; Yun-A Sung

doi:10.1117/12.2258339

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24 March 2017 Scanner-to-scanner CD analysis and control in an HVM environment

Du Hyun Beak, Ju Hee Shin, Tony Park, Dong Kyeng Han, Jin Phil Choi, Jeong Heung Kong, Young Seog Kang, Se Yeon Jang, Peter Nikolsky, Chris Strolenberg, Noh-Kyoung Park, Khalid Elbattay, Vito Tomasello, Austin Peng, Anand Guntuka, Zhao-Ze Li, Ronald Goossens, Machi Ryu, Jangho Shin, Chung-Yong Kim, Andrew Moe, Yun-A Sung

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Proceedings Volume 10147, Optical Microlithography XXX; 101470A (2017) https://doi.org/10.1117/12.2258339
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

Shrinking pattern sizes dictate that scanner-to-scanner variations for HVM products shrink proportionally. This paper shows the ability to identify (a subset of) root causes for mismatch between ArF immersion scanners using scanner metrology. The root cause identification was done in a Samsung HVM factory using a methodology (Proximity Matching Budget Breakdown or PromaBB) developed by ASML. The proper identification of root causes^-1 helps to select what combination of scanner control parameters should be used to reduce proximity differences of critical patterns while minimizing undesirable side effects from cross-compensation. Using PromaBB, the difference between predicted and measured CD mismatch was below 0.2nm. PromaBB has been proposed for HVM implementation at Samsung in combination with other ASML fab applications: Pattern Matcher Full Chip (PMFC), Image Tuner and FlexWave.

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Du Hyun Beak, Ju Hee Shin, Tony Park, Dong Kyeng Han, Jin Phil Choi, Jeong Heung Kong, Young Seog Kang, Se Yeon Jang, Peter Nikolsky, Chris Strolenberg, Noh-Kyoung Park, Khalid Elbattay, Vito Tomasello, Austin Peng, Anand Guntuka, Zhao-Ze Li, Ronald Goossens, Machi Ryu, Jangho Shin, Chung-Yong Kim, Andrew Moe, and Yun-A Sung "Scanner-to-scanner CD analysis and control in an HVM environment", Proc. SPIE 10147, Optical Microlithography XXX, 101470A (24 March 2017); https://doi.org/10.1117/12.2258339

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