To mitigate this risk, we propose an automated flow that is capable of producing large-scale realistic design content, and then optimizing the OPC recipe parameters to maximize the process window for this layout. The flow was tested with a triple-patterned 10nm node 1X metal level. First, design-rule clean layouts were produced with a tool called Layout Schema Generator (LSG). Next, the OPC recipe was optimized on these layouts, with a resulting reduction in the number of hotspots. For experimental validation, the layouts were placed on a test mask, and the predicted hotspots were compared with hardware data.
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Ayman Hamouda, Mohamed Bahnas, Dan Schumacher, Ioana Graur, Ao Chen, Kareem Madkour, Hussein Ali, Jason Meiring, Neal Lafferty, Chris McGinty, "Enhanced OPC recipe coverage and early hotspot detection through automated layout generation and analysis," Proc. SPIE 10147, Optical Microlithography XXX, 101470R (24 March 2017);