28 March 2017 Performance analyses of plasmonic lithography
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Abstract
We analyzed the field contrast, aspect ratio, pattern uniformity as well as the line-edge roughness (LER) of the patterns fabricated in plasmonic lithography. Deep subwavelength patterns with high aspect-ratio and large-area uniformity were achieved by coupling the evanescent waves into an optical waveguide as well as the selection of a single high spatial frequency mode. In addition, the impacts of defects on photomasks and the surface roughness on thin films are studied in two exemplary plasmonic lithography systems: superlens and hyperbolic metamaterials (HMM). Superlens is capable of replicating arbitrary patterns, which also inherently make it vulnerable to roughness of the thin film and imperfections on the mask; while HMM system is more immune to such imperfections due to its spatial frequency selection function property.
Conference Presentation
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Xi Chen, Gaofeng Liang, L. Jay Guo, "Performance analyses of plasmonic lithography", Proc. SPIE 10147, Optical Microlithography XXX, 101470U (28 March 2017); doi: 10.1117/12.2257912; https://doi.org/10.1117/12.2257912
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