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28 March 2017 Performance analyses of plasmonic lithography
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We analyzed the field contrast, aspect ratio, pattern uniformity as well as the line-edge roughness (LER) of the patterns fabricated in plasmonic lithography. Deep subwavelength patterns with high aspect-ratio and large-area uniformity were achieved by coupling the evanescent waves into an optical waveguide as well as the selection of a single high spatial frequency mode. In addition, the impacts of defects on photomasks and the surface roughness on thin films are studied in two exemplary plasmonic lithography systems: superlens and hyperbolic metamaterials (HMM). Superlens is capable of replicating arbitrary patterns, which also inherently make it vulnerable to roughness of the thin film and imperfections on the mask; while HMM system is more immune to such imperfections due to its spatial frequency selection function property.
Conference Presentation
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xi Chen, Gaofeng Liang, and L. Jay Guo "Performance analyses of plasmonic lithography", Proc. SPIE 10147, Optical Microlithography XXX, 101470U (28 March 2017);

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