24 March 2017 Layout independent leveling (LIL) on NXT:1980Di immersion scanners for enhanced productivity
Author Affiliations +
ASML’s 300mm scanner-systems are built on the TWINSCAN (XT/NXT) platform and yield high productivity levels for dry as well as immersion litho-scanners. NXT:1980Di immersion scanners yield productivity levels as high as 275wph while maintaining the overlay accuracy. The NXT:1980Di can be equipped with a new leveling mode that results in a significant reduction of the time that is spent on measuring the wafer focus height map. In the new leveling mode the focus height map is measured employing the full width of the level sensor and thereby minimizing the number of leveling scans. In this paper we describe the implementation of the LIL-method in the TWINSCAN platform design. Here, we report on the focus / leveling performance for both test as well as customer product wafers, and present a productivity outlook on the performance gain for a selected set of exposure use-cases.
Conference Presentation
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bram van Hoof, Bram van Hoof, Arjan Holscher, Arjan Holscher, Ralf Gommers, Ralf Gommers, Jeroen Cottaar, Jeroen Cottaar, Marcel Raas, Marcel Raas, Samah Khalek, Samah Khalek, Jan van Kemenade, Jan van Kemenade, Maarten Voncken, Maarten Voncken, Roelof de Graaf, Roelof de Graaf, Elliot Oti, Elliot Oti, Stefan Weichselbaum, Stefan Weichselbaum, Richard Droste, Richard Droste, ByeongSoo Lee, ByeongSoo Lee, Chansam Chang, Chansam Chang, Young Seog Kang, Young Seog Kang, Young Ha Kim, Young Ha Kim, Jeong-Heung Kong, Jeong-Heung Kong, Jong Hoon Jang, Jong Hoon Jang, YoungSun Nam, YoungSun Nam, Hyunwoo Hwang, Hyunwoo Hwang, } "Layout independent leveling (LIL) on NXT:1980Di immersion scanners for enhanced productivity", Proc. SPIE 10147, Optical Microlithography XXX, 101471A (24 March 2017); doi: 10.1117/12.2259794; https://doi.org/10.1117/12.2259794

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