22 January 2018 Reduction and control of intrafield focus variation on 7nm technology
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Abstract
With each technology node, overall focus budgets have become increasingly tighter in order to meet the necessary product requirements. The 7nm node has required us to define new opportunities for addressing top contributors to the focus budget. Field curvature in particular has been identified as a key contributor to the intrafield focus budget, contributing around 50%. This paper will introduce two new methodologies for improving field curvature; one a hardware solution and one a software solution.
Conference Presentation
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Jennifer Shumway, Jennifer Shumway, Nathan Neal, Nathan Neal, Sheldon Meyers, Sheldon Meyers, Jens Reichelt, Jens Reichelt, Young Ki Kim, Young Ki Kim, Justin Hanson, Justin Hanson, Ferhad Kamalizadeh, Ferhad Kamalizadeh, Dionysios Petromanolakis, Dionysios Petromanolakis, Youri van Dommelen, Youri van Dommelen, Robert Bonanni, Robert Bonanni, Arjan Gijsbertsen, Arjan Gijsbertsen, } "Reduction and control of intrafield focus variation on 7nm technology", Proc. SPIE 10147, Optical Microlithography XXX, 101470B (22 January 2018); doi: 10.1117/12.2258391; https://doi.org/10.1117/12.2258391
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