4 April 2017 Low track height standard cell design in iN7 using scaling boosters
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In this paper, standard cell design for iN7 CMOS platform technology targeting the tightest contacted poly pitch (CPP) of 42 nm and a metal pitch of 32 nm in the FinFET technology is presented. Three standard cell architectures for iN7, a 7.5-Track library, 6.5-Track library, and 6-Track library have been designed. Scaling boosters are introduced for the libraries progressively: first an extra MOL layer to enable an efficient layout of the three libraries starting with 7.5-Track library; second, fully self aligned gate contact is introduced for 6.5 and 6-Track library and third, 6-Track cell design includes a buried rail track for supply. The 6-Track cells are on average 5% and 45% smaller than the 6.5 and 7.5-Track cells, respectively.
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S. M. Y. Sherazi, S. M. Y. Sherazi, C. Jha, C. Jha, D. Rodopoulos, D. Rodopoulos, P. Debacker, P. Debacker, B. Chava, B. Chava, L. Matti, L. Matti, M. G. Bardon, M. G. Bardon, P. Schuddinck, P. Schuddinck, P. Raghavan, P. Raghavan, V. Gerousis, V. Gerousis, A. Spessot, A. Spessot, D. Verkest, D. Verkest, A. Mocuta, A. Mocuta, R. H. Kim, R. H. Kim, J. Ryckaert, J. Ryckaert, } "Low track height standard cell design in iN7 using scaling boosters", Proc. SPIE 10148, Design-Process-Technology Co-optimization for Manufacturability XI, 101480Y (4 April 2017); doi: 10.1117/12.2257658; https://doi.org/10.1117/12.2257658

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