4 April 2017 Litho hotspots fixing using model based algorithm
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Abstract
As technology advances, IC designs are getting more sophisticated, thus it becomes more critical and challenging to fix printability issues in the design flow. Running lithography checks before tapeout is now mandatory for designers, which creates a need for more advanced and easy-to-use techniques for fixing hotspots found after lithographic simulation without creating a new design rule checking (DRC) violation or generating a new hotspot. This paper presents a new methodology for fixing hotspots on layouts while using the same engine currently used to detect the hotspots. The fix is achieved by applying minimum movement of edges causing the hotspot, with consideration of DRC constraints. The fix is internally simulated by the lithographic simulation engine to verify that the hotspot is eliminated and that no new hotspot is generated by the new edge locations. Hotspot fix checking is enhanced by adding DRC checks to the litho-friendly design (LFD) rule file to guarantee that any fix options that violate DRC checks are removed from the output hint file. This extra checking eliminates the need to re-run both DRC and LFD checks to ensure the change successfully fixed the hotspot, which saves time and simplifies the designer’s workflow. This methodology is demonstrated on industrial designs, where the fixing rate of single and dual layer hotspots is reported.
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Meili Zhang, Shirui Yu, Zhibiao Mao, Marwa Shafee, Kareem Madkour, Wael ElManhawy, Joe Kwan, Xinyi Hu, Qijian Wan, Chunshan Du, "Litho hotspots fixing using model based algorithm", Proc. SPIE 10148, Design-Process-Technology Co-optimization for Manufacturability XI, 101481B (4 April 2017); doi: 10.1117/12.2257630; https://doi.org/10.1117/12.2257630
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