7 April 2017 Spin-on metal oxide materials for N7 and beyond patterning applications
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There is a growing interest in new spin on metal oxide hard mask materials for advanced patterning solutions both in BEOL and FEOL processing. Understanding how these materials respond to plasma conditions may create a competitive advantage. In this study patterning development was done for two challenging FEOL applications where the traditional Si based films were replaced by EMD spin on metal oxides, which acted as highly selective hard masks. The biggest advantage of metal oxide hard masks for advanced patterning lays in the process window improvement at lower or similar cost compared to other existing solutions.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. Mannaert, E. Altamirano-Sanchez, T. Hopf, F. Sebaai, C. Lorant, C. Petermann, S.-E. Hong, S. Mullen, E. Wolfer, D. Mckenzie, H. Yao, D. Rahman, J.-Y. Cho, M. Padmanaban, and D. Piumi "Spin-on metal oxide materials for N7 and beyond patterning applications", Proc. SPIE 10149, Advanced Etch Technology for Nanopatterning VI, 101490T (7 April 2017); doi: 10.1117/12.2264323; https://doi.org/10.1117/12.2264323


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