19 October 2016 Experimental study of 248nm excimer laser etching of alumina
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Proceedings Volume 10153, Advanced Laser Manufacturing Technology; 101530Z (2016) https://doi.org/10.1117/12.2246982
Event: International Symposium on Optoelectronic Technology and Application 2016, 2016, Beijing, China
Abstract
The 248 nm excimer laser etching characteristic of alumina ceramic and sapphire had been studied using different laser fluence and different number of pulses. And the interaction mechanism of 248 nm excimer laser with alumina ceramic and sapphire had been analyzed. The results showed that when the laser fluence was less than 8 J/cm2, the etching depth of alumina ceramic and sapphire were increased with the increase of laser fluence and number of pulses. At the high number pulses and high-energy, the surface of the sapphire had no obvious melting phenomenon, and the alumina ceramic appeared obvious melting phenomenon. The interaction mechanism of excimer laser with alumina ceramics and sapphire was mainly two-photon absorption. But because of the existence of impurities and defects, the coupling between the laser radiation and ceramic and sapphire was strong, and the thermal evaporation mechanism was also obvious.
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Hongtao Hu, Hongtao Hu, Jingzhen Shao, Jingzhen Shao, Xi Wang, Xi Wang, Xiaodong Fang, Xiaodong Fang, } "Experimental study of 248nm excimer laser etching of alumina", Proc. SPIE 10153, Advanced Laser Manufacturing Technology, 101530Z (19 October 2016); doi: 10.1117/12.2246982; https://doi.org/10.1117/12.2246982
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