19 October 2016 Tolerance analysis on diffraction efficiency and polychromatic integral diffraction efficiency for harmonic diffractive optics
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Proceedings Volume 10155, Optical Measurement Technology and Instrumentation; 1015511 (2016) https://doi.org/10.1117/12.2245583
Event: International Symposium on Optoelectronic Technology and Application 2016, 2016, Beijing, China
Abstract
In this dissertation, the mathematical model of effect of manufacturing errors including microstructure relative height error and relative width error on diffraction efficiency for the harmonic diffractive optical elements (HDEs) is set up. According to the expression of the phase delay and diffraction efficiency of the HDEs, the expression of diffraction efficiency of refraction and diffractive optical element with the microstructure height and periodic width errors in fabrication process is presented in this paper. Furthermore, the effect of manufacturing errors on diffraction efficiency for the harmonic diffractive optical elements is studied, and diffraction efficiency change is analyzed as the relative microstructure height-error in the same and in the opposite sign as well as relative width-error in the same and in the opposite sign. Example including infrared wavelength with materials GE has been discussed in this paper. Two kinds of manufacturing errors applied in 3.7~4.3um middle infrared and 8.7-11.5um far infrared optical system which results in diffraction efficiency and PIDE of HDEs are studied. The analysis results can be used for manufacturing error control in micro-structure height and periodic width. Results can be used for HDEs processing.
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Mao Shan, Mao Shan, } "Tolerance analysis on diffraction efficiency and polychromatic integral diffraction efficiency for harmonic diffractive optics", Proc. SPIE 10155, Optical Measurement Technology and Instrumentation, 1015511 (19 October 2016); doi: 10.1117/12.2245583; https://doi.org/10.1117/12.2245583
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