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6 March 1989 Characterization Of Nickel Oxide Electrochromic Films
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Proceedings Volume 1016, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion VII; (1989) https://doi.org/10.1117/12.949915
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany
Abstract
NicNickel oxide (Ni0) thin films deposited by electron-beam evaporation were studied using Fourier Transform Infrared Spectroscopy(FTIR), Rutherford Backscattering Spectroscopy (RBS), and spectrophotometry. Evaporated nickel oxide films ehibited good electrochromic behavior and a coloring efficiency of 30.1 cm2/C coating was 4.41 g/cc and stoichiometry was Nio1.4; both established by RBS. The infrared spectral properties of the as-deposited film was consistent with the structure being Ni0x. After repetitive electrochromic cycling in 1N KOH, the film changed to a structure more similiar to the hydrated nickel hydoxide films previously reported in the literature.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Niall R Lynam and Hamid R. Habibi "Characterization Of Nickel Oxide Electrochromic Films", Proc. SPIE 1016, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion VII, (6 March 1989); https://doi.org/10.1117/12.949915
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