6 March 1989 System Design For High Rate Deposition Of Indium Oxide Solar Coatings
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Proceedings Volume 1016, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion VII; (1989) https://doi.org/10.1117/12.949931
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany
Abstract
Indium oxide solar coatings have been extensively investigated and the conditions for their small scale production well characterized. For widespread use of these solar coatings they must be produced at high rate over large areas. Reactive magnetron sputtering is a suitable process and problems in extending this process to larger areas and higher rates are discussed. This is illustrated by results from a 0.5m wide coater. In a typical commercial coater the process is unstable and so process control by plasma emission monitoring (PEM) is required to give a stable deposition process. To get good film uniformity the gas must be distributed by a gas manifold and there is some interplay between the gas manifold and the PEM control. Experimental results are given to adjust the manifold design for optimum control. On a small scale coater with inherent stability we have achieved a deposition rate of 8 nm/s for indium oxide (with a resistivity of 4 x 10-6ohm.m). In a larger unstable coater with PEM control we have produced deposition rates of 6 nm/s with a slightly degraded resistivity of 6 x 10-6 ohm.m.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alaric G. Spencer, Alaric G. Spencer, Ronald P. Howson, Ronald P. Howson, } "System Design For High Rate Deposition Of Indium Oxide Solar Coatings", Proc. SPIE 1016, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion VII, (6 March 1989); doi: 10.1117/12.949931; https://doi.org/10.1117/12.949931
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