12 May 2017 The infrared spectra and laser damage threshold of the fused silica after megacoustic field assisted hydrofluoric-based etching
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Proceedings Volume 10173, Fourth International Symposium on Laser Interaction with Matter; 101730C (2017) https://doi.org/10.1117/12.2267745
Event: 4th International Symposium on Laser Interaction with Matter, 2016, Chengdu, China
Abstract
The laser-induced damage of fused silica optics significantly restricts the output ability of large laser systems. Hydrofluoric (HF)-based etching is an effective processing to eliminate impurities and mitigate subsurface defects. Traditional polished fused silica samples were etched for different time in a HF-based etchant (2.3% HF and 11.4% NH4F) assisted by a 1.3 MHz megacoustic field. The laser-induced damage thresholds (LIDT) were measured by R-on-1 method, and fourier transform infrared absorption spectras of the samples were obtained. The results of the LIDT demonstrated that the LIDTs of the fused silica samples increased after megacoustic field assisted etching. The more surface materials were removed, the higher LIDT was obtained. The analysis of the infrared spectra illustrated that structural densification materials were removed during the etching, and thus the LIDT can be improved.
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Yuan Li, Yuan Li, Ke Yang, Ke Yang, Caizhen Yao, Caizhen Yao, Zhiqiang Wang, Zhiqiang Wang, Xiaodong Yuan, Xiaodong Yuan, Hongwei Yan, Hongwei Yan, Xin Ju, Xin Ju, Liming Yang, Liming Yang, } "The infrared spectra and laser damage threshold of the fused silica after megacoustic field assisted hydrofluoric-based etching", Proc. SPIE 10173, Fourth International Symposium on Laser Interaction with Matter, 101730C (12 May 2017); doi: 10.1117/12.2267745; https://doi.org/10.1117/12.2267745
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