27 February 1989 Comparison Between Yttrium Oxide And Hydrogenated Amorphous Carbon Thin Films For Infrared Applications As Protective Coatings.
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Proceedings Volume 1019, Thin Film Technologies III; (1989) https://doi.org/10.1117/12.950017
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany
Abstract
Critical environmental conditions require optical components with enhanced surface characteristics in respect of mechanical and chemical damage. To this purpose, protective films that improve substrate cl-ia.:acte,-fistics without detriment of optical properties are used. In this paper a comparison between he properties of Y 0 and a-C:H as protective coatings in the 8-12 um is reported. The Y 0 films have been deposited by r.f. Sputtering and a-C:H by Dual ION Beam Sputtering on glass and germanium substrate. The measurements of refractive index and extinction coefficient of these films in the infrared wavelength range are presented. Moreover, the ultra-microhardness and adhesion of deposited films are compared.
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E. Masetti, S. Scaglione, L. Caneve, G. Emiliani, "Comparison Between Yttrium Oxide And Hydrogenated Amorphous Carbon Thin Films For Infrared Applications As Protective Coatings.", Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989); doi: 10.1117/12.950017; https://doi.org/10.1117/12.950017
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